A comprehensive review on emerging artificial neuromorphic devices

J Zhu, T Zhang, Y Yang, R Huang - Applied Physics Reviews, 2020 - pubs.aip.org
The rapid development of information technology has led to urgent requirements for high
efficiency and ultralow power consumption. In the past few decades, neuromorphic …

Ferroelectric field-effect transistors based on HfO2: a review

H Mulaosmanovic, ET Breyer, S Dünkel, S Beyer… - …, 2021 - iopscience.iop.org
In this article, we review the recent progress of ferroelectric field-effect transistors (FeFETs)
based on ferroelectric hafnium oxide (HfO 2), ten years after the first report on such a device …

The future of ferroelectric field-effect transistor technology

AI Khan, A Keshavarzi, S Datta - Nature Electronics, 2020 - nature.com
The discovery of ferroelectricity in oxides that are compatible with modern semiconductor
manufacturing processes, such as hafnium oxide, has led to a re-emergence of the …

[HTML][HTML] Next generation ferroelectric materials for semiconductor process integration and their applications

T Mikolajick, S Slesazeck, H Mulaosmanovic… - Journal of Applied …, 2021 - pubs.aip.org
Ferroelectrics are a class of materials that possess a variety of interactions between
electrical, mechanical, and thermal properties that have enabled a wealth of functionalities …

[HTML][HTML] Ferroelectric field effect transistors: Progress and perspective

JY Kim, MJ Choi, HW Jang - APL Materials, 2021 - pubs.aip.org
Ferroelectric field effect transistors (FeFETs) have attracted attention as next-generation
devices as they can serve as a synaptic device for neuromorphic implementation and a one …

Van der Waals engineering of ferroelectric heterostructures for long-retention memory

X Wang, C Zhu, Y Deng, R Duan, J Chen… - Nature …, 2021 - nature.com
The limited memory retention for a ferroelectric field-effect transistor has prevented the
commercialization of its nonvolatile memory potential using the commercially available …

Ferroelectric HfO2 Memory Transistors With High-κ Interfacial Layer and Write Endurance Exceeding 1010 Cycles

AJ Tan, YH Liao, LC Wang, N Shanker… - IEEE Electron …, 2021 - ieeexplore.ieee.org
We demonstrate ferroelectric (FE) memory transistors on a crystalline silicon channel with
endurance exceeding 10 10 cycles. The ferroelectric transistors (FeFETs) incorporate a high …

Critical Role of Interlayer in Hf0.5Zr0.5O2 Ferroelectric FET Nonvolatile Memory Performance

K Ni, P Sharma, J Zhang, M Jerry… - … on Electron Devices, 2018 - ieeexplore.ieee.org
We fabricate, characterize, and establish the critical design criteria of Hf 0.5 Zr 0.5 O 2 (HZO)-
based ferroelectric field effect transistor (FeFET) for nonvolatile memory application. We …

Ferroelectric Hf0.5Zr0.5O2 Thin Films: A Review of Recent Advances

SJ Kim, J Mohan, SR Summerfelt, J Kim - Jom, 2019 - Springer
Ferroelectricity in HfO 2-based materials, especially Hf 0.5 Zr 0.5 O 2 (HZO), is today one of
the most attractive topics because of its wide range of applications in ferroelectric random …

Compute in‐memory with non‐volatile elements for neural networks: A review from a co‐design perspective

W Haensch, A Raghunathan, K Roy… - Advanced …, 2023 - Wiley Online Library
Deep learning has become ubiquitous, touching daily lives across the globe. Today,
traditional computer architectures are stressed to their limits in efficiently executing the …