A versatile time-of-flight medium-energy ion scattering setup using multiple delay-line detectors

MA Sortica, MK Linnarsson, D Wessman… - Nuclear Instruments and …, 2020 - Elsevier
We present the most recent upgrades of the time-of-flight medium energy ion scattering (TOF-
MEIS) system in Uppsala. The experimental chamber features a 6-axis goniometer with a …

Characterization of nanoparticles through medium-energy ion scattering

MA Sortica, PL Grande, G Machado… - Journal of Applied Physics, 2009 - pubs.aip.org
In this work we review the use of the medium-energy ion scattering (MEIS) technique to
characterize nanostructures at the surface of a substrate. We discuss here how the …

[HTML][HTML] Picosecond pulsed beams of light and heavy keV ions at the Time-of-Flight Medium energy ion scattering system at Uppsala University

E Ntemou, R Holeňák, D Wessman… - Nuclear Instruments and …, 2024 - Elsevier
A 16 MHz electrostatic beam chopper is implemented at the Uppsala University ToF-MEIS
system to complement the 4 MHz sinusoidal scanning, refining the resolution without drift …

Structural characterization of CdSe/ZnS quantum dots using medium energy ion scattering

MA Sortica, PL Grande, C Radtke, LG Almeida… - Applied Physics …, 2012 - pubs.aip.org
In the present work, we have analyzed CdSe/ZnS core-shell quantum dots by medium
energy ion scattering (MEIS), which is a powerful technique to explore the synthesis …

Electrical and structural properties of ternary rare-earth oxides on Si and higher mobility substrates and their integration as high-k gate dielectrics in MOSFET devices

JM Lopes, ED Özben, M Schnee, R Luptak… - ECS …, 2011 - iopscience.iop.org
The continuous downscaling in metal-oxide-semiconductor field effect transistors is
approaching fundamental limits. Allied to new device architectures, novel materials are …

Structural and electrical properties of terbium scandate films deposited by atomic layer deposition and high temperature annealing effects

E Cianci, A Lamperti, G Congedo… - ECS Journal of Solid …, 2012 - iopscience.iop.org
In this work terbium scandate thin films have been deposited by atomic layer deposition
(ALD) on SiO 2/Si and Si 3 N 4/SiO 2/Si stacks and their structural and electrical behavior as …

Silicon Nitride, Silicon Dioxide, and Emerging Dielectrics 11

RE Sah - 2011 - books.google.com
This issue of ECS Transactions contains the peer-reviewed full length papers of the
International Symposium on Silicon Nitride, Silicon Dioxide, and Emerging Dielectrics held …

Atomic layer deposition of HfO2 and Al2O3 layers on 300 mm Si wafers for gate stack technology

R Lupták, JMJ Lopes, S Lenk, B Holländer… - Journal of Vacuum …, 2011 - pubs.aip.org
In this study, the authors present results on the structural, chemical, and electrical
characterization of HfO 2 thin layers on 300 mm Si wafers. The layers were prepared by …

Caracterização de nanoestruturas através da técnica MEIS

MA Sortica - 2009 - lume.ufrgs.br
Espalhamento de íons de energia intermediária (MEIS) é uma técnica analítica de feixe de
íons que pode determinar quantitativamente composições elbmentares e perfis I de …

[PDF][PDF] Nuclear Inst. and Methods in Physics Research, B

E Ntemou, R Holenák, D Wessman… - … and Methods in …, 2024 - researchgate.net
ABSTRACT A 16 MHz electrostatic beam chopper is implemented at the Uppsala University
ToF-MEIS system to complement the 4 MHz sinusoidal scanning, refining the resolution …