Coefficient of thermal expansion and elastic modulus of thin films

MM de Lima Jr, RG Lacerda, J Vilcarromero… - Journal of Applied …, 1999 - pubs.aip.org
The coefficient of thermal expansion (CTE), biaxial modulus, and stress of some amorphous
semiconductors (a-Si: H, aC: H, a-Ge: H, and a-GeC x: H) and metallic (Ag and Al) thin films …

[PDF][PDF] Paper I: Ultrathin Resonant-Cavity-Enhanced Solar Cells with Amorphous Germanium Absorbers

V Steenhoff, M Theuring, M Vehse… - Development of …, 2015 - d-nb.info
Ultrathin 1D optical cavities enable strong and spectrally broad absorption in solar cells.
This approach requires highly absorptive materials as well as tailoring of the phase shifts …

High performance glow discharge of large

P Wickboldt, D Pang, W Paul, JH Chen… - Journal of Applied …, 1997 - pubs.aip.org
Radio frequency glow discharge chemical vapor deposition has been used to deposit thin
films of a-Si 1− x Ge x: H which possess optoelectronic properties that are greatly improved …

Stress and thermomechanical properties of amorphous hydrogenated germanium thin films deposited by glow discharge

FC Marques, P Wickboldt, D Pang, JH Chen… - Journal of applied …, 1998 - pubs.aip.org
Stress measurements of a-Ge: H thin films deposited by rf glow discharge using a large
variety of deposition conditions are reported. It was observed that the stress of the films is …

Organometallic Chemical Vapor Deposition of Germanium from a Cyclic Germylene, 1,3-Di-tert-butyl-1,3,2-diazagermolidin-2-ylidine

S Vepřek, J Prokop, F Glatz, R Merica… - Chemistry of …, 1996 - ACS Publications
Investigations into the kinetics and mechanism of the thermal decomposition of the novel
organometallic precursor 1, 3-di-tert-butyl-1, 3, 2-diazagarmolidin-2-ylidine are reported. On …

Density of states in hydrogenated amorphous germanium seen via optical absorption spectra

Y Bouizem, A Belfedal, JD Sib, L Chahed - Solid state communications, 2003 - Elsevier
We propose and discuss a deconvolution procedure to analyze quantitatively optical
absorption spectra. This procedure is used to determine the density of states distribution in …

[PDF][PDF] Low-temperature micro-opto-electro-mechanical technologies for temperature sensitive substrates

M Martyniuk - 2006 - research-repository.uwa.edu.au
The salient feature of next generation infrared (IR) on-chip integrated sensors is likely to be
sensitivity in a narrow wavelength band that is tuneable over a selected range of the IR …

Optimization of process parameters for the deposition of improved a‐Ge: H by dc magnetron sputtering

T Drüsedau, B Schröder - Journal of applied physics, 1994 - pubs.aip.org
A detailed study of the influence of hydrogen and argon partial pressures, substrate
temperature, and dc power on the composition and the optoelectronic properties of …

Influence of plasma conditions on the defect formation mechanism in amorphous hydrogenated silicon

P Kounavis, D Mataras, N Spiliopoulos… - Journal of applied …, 1994 - pubs.aip.org
The variation of a‐Si: H film quality, deposited by a rf glow discharge of pure silane, is
examined as a function of the interelectrode distance for two different pressures. Constant …

Films thickness effect on structural and optoelectronic properties of hydrogenated amorphous germanium (a-Ge: H)

A Belfedal, Y Bouizem, JD Sib, L Chahed - Journal of non-crystalline solids, 2012 - Elsevier
Thin films of hydrogenated amorphous germanium (a-Ge: H) deposited at high growth rate
by radiofrequency (RF) glow discharge with 1sccm GeH4 diluted in 40sccm H2 have been …