Controlled growth of nanocrystalline aluminum nitride films for full color range

X Shi, X Yu, C Nie, F Li, S Zhang - Ceramics International, 2021 - Elsevier
Color films are widely used for visual effect as well as for their functional properties. To date,
however, synthesizing thin films with desired color remains challenging. In this work, AlN …

Transfer Printing of Solution‐Processed 3D ZnO Nanostructures with Ultra‐High Yield for Flexible Metasurface Color Filter

H Liu, H Peng, K Li, L Lu, J Deng, Y Liu… - Advanced Materials …, 2022 - Wiley Online Library
This work describes a facile thermal transfer printing process for solution‐processed high‐
quality ZnO nanostructures. Nanostructures are synthesized through patterned solution …

Reactive magnetron sputtered AlN thin films: structural, linear and nonlinear optical characteristics

HA Alyousef, AM Hassan, HMH Zakaly - Journal of Materials Science …, 2023 - Springer
This study investigates the structural and optical characteristics of aluminum nitride (AlN)
thin films deposited using reactive magnetron sputtering (dcMS) in an Ar+ N2 (80: 20%) …

Pulsed laser deposition of aluminum nitride films: Correlation between mechanical, optical, and structural properties

L Kolaklieva, V Chitanov, A Szekeres, K Antonova… - Coatings, 2019 - mdpi.com
Aluminum nitride (AlN) films were synthesized onto Si (100) substrates by pulsed laser
deposition (PLD) in vacuum or nitrogen, at 0.1, 1, 5, or 10 Pa, and substrate temperatures …

Theoretical and experimental approaches for the determination of functional properties of MgSnN2 thin films

F Alnjiman, A Virfeu, D Pilloud, S Diliberto… - Solar Energy Materials …, 2022 - Elsevier
MgSnN 2 thin films were deposited by reactive magnetron co-sputtering on fused silica and
silicon substrates. The properties of the films were determined as a function of the deposition …

Growth, interfacial microstructure and optical properties of NiO thin films with various types of texture

Y Wang, J Ghanbaja, P Boulet, D Horwat, JF Pierson - Acta Materialia, 2019 - Elsevier
NiO thin films with random, fiber and in-plane textures have been successfully deposited at
near room temperature by reactive magnetron sputtering on glass, silicon and Al 2 O 3 …

Optical characterization of sputtered aluminum nitride thin films–correlating refractive index with degree of c-axis orientation

A Ababneh, Z Albataineh, AMK Dagamseh… - Thin Solid Films, 2020 - Elsevier
Abstract Aluminum Nitride (AlN) is a well-known compound piezoelectric material with high
Complementary Metal-Oxide Semiconductor process compatibility. Previous results show …

[HTML][HTML] Texture in ITO films deposited at oblique incidence by ion beam sputtering

B Lacroix, F Paumier, AJ Santos, F Maudet… - Applied Surface …, 2022 - Elsevier
Texture of crystalline In 2 O 3: Sn (ITO) thin films prepared by combining ion beam sputtering
(IBS) at room temperature and oblique angle deposition (OAD) has been studied depending …

Minimizing film residual stress with in situ OES big data using principal component analysis of deposited AlN films by pulsed DC reactive sputtering

TY Lu, YP Yang, HH Lo, PJ Wang, W Lai… - … International Journal of …, 2021 - Springer
In this study, aluminum nitride (AlN) thin films were deposited on Si (100) and investigated
on the minimum film residual stress with varying two critical deposition conditions in N 2 gas …

Influence of the target power on the microstructure and electrical properties of Al-doped ZnO thin films deposited at room temperature

H Liu, X Wang, M Li, L Wu, Y Yan, J Xiong, X Qu… - Ceramics …, 2020 - Elsevier
The columnar structure and its formation process have a significant effect on the electrical
properties of Al-doped ZnO (AZO) thin film in-situ deposited at room temperature by …