The paradigm shift in understanding the bias temperature instability: From reaction–diffusion to switching oxide traps

T Grasser, B Kaczer, W Goes… - … on Electron Devices, 2011 - ieeexplore.ieee.org
One of the most important degradation modes in CMOS technologies, the bias temperature
instability (BTI) has been known since the 1960s. Already in early interpretations, charge …

Analog Circuits and Signal Processing

M Ismail, M Sawan - 2013 - Springer
Today, micro-electronic circuits are undeniably and ubiquitously present in our society.
Transportation vehicles such as cars, trains, buses, and airplanes make abundant use of …

Modelling RTN and BTI in nanoscale MOSFETs from device to circuit: A review

L Gerrer, J Ding, SM Amoroso, F Adamu-Lema… - Microelectronics …, 2014 - Elsevier
In this paper we summarize the impact of Statistical Variability (SV) on device performances
and study the impact of oxide trapped charges in combination with SV. Traps time constants …

A unified perspective of RTN and BTI

T Grasser, K Rott, H Reisinger, M Waltl… - 2014 IEEE …, 2014 - ieeexplore.ieee.org
It has recently been suggested that random telegraph noise (RTN) and the bias temperature
instability (BTI) are due to similar defects. Here we thoroughly analyze this hypothesis using …

Reliability challenges of real-time systems in forthcoming technology nodes

S Hamdioui, D Gizopoulos, G Guido… - … , Automation & Test …, 2013 - ieeexplore.ieee.org
Forthcoming technology nodes are posing major challenges on the manufacturing of
reliable (real-time) systems: process variations, accelerated degradation aging, as well as …

Impact of single charged gate oxide defects on the performance and scaling of nanoscaled FETs

J Franco, B Kaczer, M Toledano-Luque… - 2012 IEEE …, 2012 - ieeexplore.ieee.org
We report extensive statistical NBTI reliability measurements of nanoscaled FETs of different
technologies, based on which we propose a 1/area scaling rule for the statistical impact of …

Characterization of time-dependent variability using 32k transistor arrays in an advanced HK/MG technology

P Weckx, B Kaczer, C Chen, J Franco… - 2015 IEEE …, 2015 - ieeexplore.ieee.org
Here we show that nFET and pFET time-dependent variability, in addition to the standard
time-zero variability, can be fully characterized and projected using a series of …

BTI impact on logical gates in nano-scale CMOS technology

S Khan, S Hamdioui, H Kukner… - 2012 IEEE 15th …, 2012 - ieeexplore.ieee.org
As semiconductor manufacturing has entered into the nanoscale era, Bias Temperature
Instability (BTI)-Negative BTI (NBTI) in PMOS transistors and Positive BTI (PBTI) in NMOS …

Implications of BTI-induced time-dependent statistics on yield estimation of digital circuits

P Weckx, B Kaczer, M Toledano-Luque… - … on Electron Devices, 2014 - ieeexplore.ieee.org
This paper describes the implications of bias temperature instability (BTI)-induced time-
dependent threshold voltage distributions on the performance and yield estimation of digital …

NBTI-generated defects in nanoscaled devices: Fast characterization methodology and modeling

R Gao, Z Ji, AB Manut, JF Zhang… - … on Electron Devices, 2017 - ieeexplore.ieee.org
Negative bias temperature instability (NBTI)-generated defects (GDs) have been widely
observed and known to play an important role in device's lifetime. However, its …