In plasma-based deposition processing, the importance of low-energy ion bombardment
during thin film growth can hardly be exaggerated. Ion bombardment is an important …

Biaxially aligned thin films have not only a preferential crystallographic out-of-plane
orientation, but also have an alignment along a certain reference direction parallel to the …

The use of thin films to enhance the physical and chemical properties of materials is
ubiquitous in today's world. Examples are shown in Fig. 1: copper metallization layers for …

Atomic-scale control and manipulation of the microstructure of polycrystalline thin films
during kinetically limited low-temperature deposition, crucial for a broad range of industrial …

During the last decade the dc and rf sputtering techniques have been used extensively in
their two configurations—balanced and unbalanced magnetron. The main applications have …

Modern condensed-matter physics is increasingly concerned with the design, synthesis,
analysis, and exploitation of chemically complex materials and structures. Complex metal …

The growth of reactively sputtered TiN films is discussed. First, an overview of the existing
models in the literature that describe the development of the orientation and microstructure …

HIPIMS (High Power Impulse Magnetron Sputtering) discharge is a new PVD technology for
the deposition of high-quality thin films. The deposition flux contains a high degree of metal …

A wide range of material treatment and nanosynthesis technologies can be significantly
enhanced by the use of a plasma-based process environment, with the benefits ranging …

Zirconium-based coatings have found important uses ranging from functional deposits on
carbon fibers, field emitters, nuclear fuel particles, and dental and body implants to …