Novel materials for high-efficiency III–V multi-junction solar cells

M Yamaguchi, KI Nishimura, T Sasaki, H Suzuki… - Solar Energy, 2008 - Elsevier
As a result of developing wide bandgap InGaP double hetero structure tunnel junction for
sub-cell interconnection, InGaAs middle cell lattice-matched to Ge substrate, and InGaP-Ge …

Multi-junction (III–V) solar cells: From basics to advanced materials choices

K Ali, A Khalid, MR Ahmad, HM Khan, I Ali… - Solar Cells: From …, 2020 - Springer
Solar cell efficiency can be associated with the ability of the solar cell to produce the
maximum amount of electricity from a light energy source. There are many uses of multi …

Improvements in optoelectrical properties of GaAsN by controlling step density during chemical beam epitaxy growth

H Suzuki, M Inagaki, T Honda, Y Ohshita… - Japanese Journal of …, 2010 - iopscience.iop.org
Improvements in optoelectrical properties of GaAsN are demonstrated by chemical beam
epitaxy (CBE) growth on high-step-density GaAs substrates. The step density at the growing …

Chemical beam epitaxy of GaAsN thin films with monomethylhydrazine as N source

K Nishimura, HS Lee, H Suzuki, Y Ohshita… - Japanese journal of …, 2007 - iopscience.iop.org
GaAsN thin films were grown by chemical beam epitaxy (CBE) with monomethylhydrazine
(MMHy) as a N source. Processes that determine the N composition in the GaAsN thin films …

Carbon incorporation process in GaAsN films grown by chemical beam epitaxy using MMHy or DMHy as the N source

H Suzuki, K Nishimura, HS Lee, Y Ohshita, N Kojima… - Thin Solid Films, 2007 - Elsevier
Crystal quality of GaAsN films can be improved by using CBE for low-temperature growth.
However, low-temperature growth increases C incorporation in the films, which degrades …

N–H related defects in GaAsN grown through chemical beam epitaxy

Y Ohshita, K Ikeda, H Suzuki, H Machida… - Japanese Journal of …, 2014 - iopscience.iop.org
The local vibration modes of N–H related defects in GaAsN are studied using isotopes.
When GaAsN is grown through chemical beam epitaxy (CBE) using triethylgallium/tris …

Effects of residual carbon and hydrogen atoms on electrical property of GaAsN films grown by chemical beam epitaxy

H Suzuki, K Nishimura, K Saito… - Japanese journal of …, 2008 - iopscience.iop.org
The electrical behavior of nitrogen–hydrogen (N–H) complexes and carbon (C) atoms in
GaAsN films grown by the chemical beam epitaxy (CBE) method have been studied by …

CVD reactors and delivery system technology

SP Krumdieck - Chemical Vapour Deposition Precursors …, 2008 - books.google.com
From the engineering perspective, the CVD system is essentially a ''molecular
scale''manufacturing facility. Just like any factory, the production rate is determined by the …

Hydrogen reduction in GaAsN thin films by flow rate modulated chemical beam epitaxy

K Saito, K Nishimura, H Suzuki, Y Ohshita… - Thin Solid Films, 2008 - Elsevier
The amount of residual H in the GaAsN film grown by chemical beam epitaxy (CBE) can be
decreased by flow rate modulation growth. Many H atoms in the films grown by CBE exist as …

Electrical properties of GaAsN/GaAs-superlattice films with different N distributions fabricated by atomic layer epitaxy

M Kawano, T Haraguchi, H Suzuki - Journal of Crystal Growth, 2025 - Elsevier
The effects of nitrogen (N) distribution on the electrical properties of GaAsN films were
evaluated by intentionally changing the N distribution using atomic layer epitaxy (ALE) and …