Bottom-up nanofabrication by area-selective atomic layer deposition (ALD) is currently
gaining momentum in semiconductor processing, because of the increasing need for …

Atomic layer deposition (ALD) has emerged as an interesting tool for the atomically precise
design and synthesis of catalytic materials. Herein, we discuss examples in which the atomic …

In the past decade, atomic layer deposition (ALD) has become an important thin film
deposition technique for applications in nanoelectronics, catalysis, and other areas due to its …

Area-selective atomic layer deposition (ALD) is rapidly gaining interest because of its
potential application in self-aligned fabrication schemes for next-generation …

Area-selective atomic layer deposition (ALD) is an approach to self-aligned, bottom-up
nanofabrication with the potential to overcome many of the challenges facing the …

Atomic layer deposition (ALD) is a thin film synthesis technique that can provide exquisite
accuracy and precision in film thickness and composition even on complex, large area …

The applications of atomic layer deposition (ALD) technology in the Li‐ion field are
numerous: from protective coatings to high‐surface area active materials and composite …

Thin films of stable metal-organic frameworks (MOFs) such as UiO-66 have enormous
application potential, for instance in microelectronics. However, all-gas-phase deposition …

Despite the rapid increase in the number of newly developed processes, area-selective
atomic layer deposition (ALD) of nitrides is largely unexplored. ALD of nitrides at low …

Ceramic membranes are a promising alternative to polymeric membranes for selective
separations, given their ability to operate under harsh chemical conditions. However, current …