Evolution in lithography techniques: microlithography to nanolithography
E Sharma, R Rathi, J Misharwal, B Sinhmar, S Kumari… - Nanomaterials, 2022 - mdpi.com
In this era, electronic devices such as mobile phones, computers, laptops, sensors, and
many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying …
many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying …
MEMS inductor fabrication and emerging applications in power electronics and neurotechnologies
MEMS inductors are used in a wide range of applications in micro-and nanotechnology,
including RF MEMS, sensors, power electronics, and Bio-MEMS. Fabrication technologies …
including RF MEMS, sensors, power electronics, and Bio-MEMS. Fabrication technologies …
Comparison between focused electron/ion beam-induced deposition at room temperature and under cryogenic conditions
JM De Teresa, P Orús, R Córdoba, P Philipp - Micromachines, 2019 - mdpi.com
In this contribution, we compare the performance of Focused Electron Beam-induced
Deposition (FEBID) and Focused Ion Beam-induced Deposition (FIBID) at room temperature …
Deposition (FEBID) and Focused Ion Beam-induced Deposition (FIBID) at room temperature …
Three-dimensional in situ electron-beam lithography using water ice
Three-dimensional (3D) nanofabrication techniques are of paramount importance in
nanoscience and nanotechnology because they are prerequisites to realizing complex …
nanoscience and nanotechnology because they are prerequisites to realizing complex …
Quantitative assessment of the absorbed dose in cryodeposited noble-gas films under X-ray irradiation: Simulation vs. experiment
PV Zasimov, AV Belousov, IA Baranova… - Radiation Physics and …, 2020 - Elsevier
This work was aimed at quantitative determination of the absorbed doses under X-ray
irradiation of cryogenic deposited films, particularly related to the matrix isolation …
irradiation of cryogenic deposited films, particularly related to the matrix isolation …
Electron beam lithography on nonplanar and irregular surfaces
E-beam lithography is a powerful tool for generating nanostructures and fabricating
nanodevices with fine features approaching a few nanometers in size. However, alternative …
nanodevices with fine features approaching a few nanometers in size. However, alternative …
Electron-beam patterning of vapor-deposited solid anisole
The emerging ice lithography (IL) nanofabrication technology differs from conventional
electron-beam lithography by working at cryogenic temperatures and using vapor-deposited …
electron-beam lithography by working at cryogenic temperatures and using vapor-deposited …
In Situ Time-of-Flight Mass Spectrometry of Ionic Fragments Induced by Focused Electron Beam Irradiation: Investigation of Electron Driven Surface Chemistry inside …
J Jurczyk, L Pillatsch, L Berger, A Priebe, K Madajska… - Nanomaterials, 2022 - mdpi.com
Recent developments in nanoprinting using focused electron beams have created a need to
develop analysis methods for the products of electron-induced fragmentation of different …
develop analysis methods for the products of electron-induced fragmentation of different …
Effect of molecular weight on the feature size in organic ice resists
The feature size of patterns obtained by electron-beam lithography (EBL) depends critically
on resist properties, beam parameters, development process, and instrument limitations …
on resist properties, beam parameters, development process, and instrument limitations …