Evolution in lithography techniques: microlithography to nanolithography

E Sharma, R Rathi, J Misharwal, B Sinhmar, S Kumari… - Nanomaterials, 2022 - mdpi.com
In this era, electronic devices such as mobile phones, computers, laptops, sensors, and
many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying …

MEMS inductor fabrication and emerging applications in power electronics and neurotechnologies

HT Le, RI Haque, Z Ouyang, SW Lee, SI Fried… - Microsystems & …, 2021 - nature.com
MEMS inductors are used in a wide range of applications in micro-and nanotechnology,
including RF MEMS, sensors, power electronics, and Bio-MEMS. Fabrication technologies …

Comparison between focused electron/ion beam-induced deposition at room temperature and under cryogenic conditions

JM De Teresa, P Orús, R Córdoba, P Philipp - Micromachines, 2019 - mdpi.com
In this contribution, we compare the performance of Focused Electron Beam-induced
Deposition (FEBID) and Focused Ion Beam-induced Deposition (FIBID) at room temperature …

[HTML][HTML] Ice lithography for 3D nanofabrication

D Zhao, A Han, M Qiu - Science Bulletin, 2019 - Elsevier
Nanotechnology and nanoscience are enabled by nanofabrication. Electron-beam
lithography, which makes 2D patterns down to a few nanometers, is one of the fundamental …

Three-dimensional in situ electron-beam lithography using water ice

Y Hong, D Zhao, D Liu, B Ma, G Yao, Q Li, A Han… - Nano …, 2018 - ACS Publications
Three-dimensional (3D) nanofabrication techniques are of paramount importance in
nanoscience and nanotechnology because they are prerequisites to realizing complex …

Quantitative assessment of the absorbed dose in cryodeposited noble-gas films under X-ray irradiation: Simulation vs. experiment

PV Zasimov, AV Belousov, IA Baranova… - Radiation Physics and …, 2020 - Elsevier
This work was aimed at quantitative determination of the absorbed doses under X-ray
irradiation of cryogenic deposited films, particularly related to the matrix isolation …

Electron beam lithography on nonplanar and irregular surfaces

C Zhu, H Ekinci, A Pan, B Cui, X Zhu - Microsystems & …, 2024 - nature.com
E-beam lithography is a powerful tool for generating nanostructures and fabricating
nanodevices with fine features approaching a few nanometers in size. However, alternative …

Electron-beam patterning of vapor-deposited solid anisole

D Zhao, B Chang, M Beleggia - ACS applied materials & …, 2020 - ACS Publications
The emerging ice lithography (IL) nanofabrication technology differs from conventional
electron-beam lithography by working at cryogenic temperatures and using vapor-deposited …

In Situ Time-of-Flight Mass Spectrometry of Ionic Fragments Induced by Focused Electron Beam Irradiation: Investigation of Electron Driven Surface Chemistry inside …

J Jurczyk, L Pillatsch, L Berger, A Priebe, K Madajska… - Nanomaterials, 2022 - mdpi.com
Recent developments in nanoprinting using focused electron beams have created a need to
develop analysis methods for the products of electron-induced fragmentation of different …

Effect of molecular weight on the feature size in organic ice resists

A Elsukova, A Han, D Zhao, M Beleggia - Nano Letters, 2018 - ACS Publications
The feature size of patterns obtained by electron-beam lithography (EBL) depends critically
on resist properties, beam parameters, development process, and instrument limitations …