Defect engineering in SiC technology for high-voltage power devices

T Kimoto, H Watanabe - Applied Physics Express, 2020 - iopscience.iop.org
Major features of silicon carbide (SiC) power devices include high blocking voltage, low on-
state loss, and fast switching, compared with those of the Si counterparts. Through recent …

[HTML][HTML] A review on resistive switching in high-k dielectrics: a nanoscale point of view using conductive atomic force microscope

M Lanza - Materials, 2014 - mdpi.com
Metal-Insulator-Metal (MIM) structures have raised as the most promising configuration for
next generation information storage, leading to great performance and fabrication-friendly …

[HTML][HTML] Nanopore fabrication by controlled dielectric breakdown

H Kwok, K Briggs, V Tabard-Cossa - PloS one, 2014 - journals.plos.org
Nanofabrication techniques for achieving dimensional control at the nanometer scale are
generally equipment-intensive and time-consuming. The use of energetic beams of …

[图书][B] Reliability physics and engineering

JW McPherson, JW McPherson, Glaser - 2010 - Springer
All engineers could benefit from at least one course in Reliability Physics & Engineering. It is
very likely that, starting with your very first engineering position, you will be asked—how long …

Ultrathin (<4 nm) and Si–O–N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits

ML Green, EP Gusev, R Degraeve… - Journal of Applied …, 2001 - pubs.aip.org
The outstanding properties of SiO 2, which include high resistivity, excellent dielectric
strength, a large band gap, a high melting point, and a native, low defect density interface …

Radiation effects in a post-Moore world

DM Fleetwood - IEEE Transactions on Nuclear Science, 2021 - ieeexplore.ieee.org
An overview is presented of the significant influences of Moore's Law scaling on radiation
effects on microelectronics, focusing on historical trends and future needs. A number of …

New insights in the relation between electron trap generation and the statistical properties of oxide breakdown

R Degraeve, G Groeseneken, R Bellens… - … on Electron Devices, 1998 - ieeexplore.ieee.org
In this paper it is demonstrated in a wide stress field range that breakdown in thin oxide
layers occurs as soon as a critical density of neutral electron traps in the oxide is reached. It …

Dielectric breakdown mechanisms in gate oxides

S Lombardo, JH Stathis, BP Linder, KL Pey… - Journal of applied …, 2005 - pubs.aip.org
In this paper we review the subject of oxide breakdown (BD), focusing our attention on the
case of the gate dielectrics of interest for current Si microelectronics, ie, Si oxides or …

NBTI degradation: From physical mechanisms to modelling

V Huard, M Denais, C Parthasarathy - Microelectronics Reliability, 2006 - Elsevier
An overview of the evolution of transistor parameters under negative bias temperature
instability stress conditions commonly observed in p-MOSFETs in recent technologies is …

Time dependent dielectric breakdown physics–Models revisited

JW McPherson - Microelectronics Reliability, 2012 - Elsevier
Time-Dependent Dielectric Breakdown (TDDB) models for silica (SiO2)-based dielectrics
are revisited so as to better understand the ability of each model to explain quantitatively the …