Liquid crystal temperature control by resistive heating
A Hegyi - US Patent 10,884,278, 2021 - Google Patents
An optical device includes a first transparent substrate having a first transparent electrode
disposed on a surface of the first transparent substrate and a second substrate having a …
disposed on a surface of the first transparent substrate and a second substrate having a …
Thermal processing method through light irradiation
T Aoyama, H Kawarazaki - US Patent 10,446,397, 2019 - Google Patents
When an insulated gate bipolar transistor is incorporated in a drive circuit of a flash lamp, so
that a light emission pattern of the flash lamp is freely defined, a temperature change pattern …
that a light emission pattern of the flash lamp is freely defined, a temperature change pattern …
UV/VIS/IR backside-illuminated photon-counting sensor
Some embodiments of the present disclosure provide a semiconductor-based photon-
counting sensor comprising a metal-insulator-semiconductor internal photoemission (eg …
counting sensor comprising a metal-insulator-semiconductor internal photoemission (eg …
Germanium-on-silicon laser in CMOS technology
A germanium waveguide is formed from a P-type silicon substrate that is coated with a
heavily-doped N-type germanium layer and a first N-type doped silicon layer. Trenches are …
heavily-doped N-type germanium layer and a first N-type doped silicon layer. Trenches are …
Plasma power generator (z-box and z-tower)
A Dhyllon - US Patent 10,342,110, 2019 - Google Patents
US10342110B1 - Plasma power generator (z-box and z-tower) - Google Patents US10342110B1
- Plasma power generator (z-box and z-tower) - Google Patents Plasma power generator …
- Plasma power generator (z-box and z-tower) - Google Patents Plasma power generator …
Antimony co-doping with phosphorus to form ultrashallow junctions using atomic layer deposition and annealing
YS Kim, E Burte, B Kalkofen - US Patent 10,522,354, 2019 - Google Patents
A method for processing a substrate includes providing a substrate with a layer including a
material selected from a group consisting of silicon (Si), germanium (Ge) and silicon …
material selected from a group consisting of silicon (Si), germanium (Ge) and silicon …
Semiconductor device containing oxygen-related thermal donors
JG Laven, M Jelinek, HJ Schulze… - US Patent …, 2019 - Google Patents
A method of manufacturing a semiconductor device includes determining information that
indicates an extrinsic dopant concentration and an intrinsic oxygen concentration in a …
indicates an extrinsic dopant concentration and an intrinsic oxygen concentration in a …
Germanium-on-silicon laser in CMOS technology
A germanium waveguide is formed from a P-type silicon substrate that is coated with a
heavily-doped N-type germanium layer and a first N-type doped silicon layer. Trenches are …
heavily-doped N-type germanium layer and a first N-type doped silicon layer. Trenches are …
Methods of doping a silicon-containing material and methods of forming a semiconductor device
FH Fabreguette, JA Smythe, W Kula - US Patent 10,937,654, 2021 - Google Patents
(57) ABSTRACT A method of doping a silicon-containing material. The method comprises
forming at least one opening in a silicon containing material and conformally forming a …
forming at least one opening in a silicon containing material and conformally forming a …
Method to form ultrashallow junctions using atomic layer deposition and annealing
YS Kim, E Burte, B Kalkofen - US Patent 10,770,297, 2020 - Google Patents
A method for processing a substrate includes providing a substrate with a layer including a
material selected from a group consisting of silicon (Si), germanium (Ge) and silicon …
material selected from a group consisting of silicon (Si), germanium (Ge) and silicon …