Influence of gate and channel engineering on multigate MOSFETs-A review

R Ramesh - Microelectronics journal, 2017 - Elsevier
The design of CMOS circuits using nanoscale MOSFET has become very difficult nowadays
as device modeling faces new challenges such as short channel effects and mobility …

2-D analytical threshold voltage model for dielectric pocket double-gate junctionless FETs by considering source/drain depletion effect

B Singh, D Gola, K Singh, E Goel… - IEEE Transactions on …, 2017 - ieeexplore.ieee.org
This paper proposes an analytical threshold voltage model for the dielectric pocket double
gate (DP-DG) junctionless FETs (JLFETs). The channel potential function has been obtained …

Investigating linearity and effect of temperature variation on analog/RF performance of dielectric pocket high-k double gate-all-around (DP-DGAA) MOSFETs

V Purwar, R Gupta, N Kumar, H Awasthi, VK Dixit… - Applied Physics A, 2020 - Springer
The present paper is about using three popular performance boosters in a device to battle
with deterioration in device characteristics imposed by temperature variation. The dielectric …

Impact of dielectric pocket on analog/RF performance of short channel double gate MOSFET

A Gupta, N Maurya, S Rai - 2017 4th International Conference …, 2017 - ieeexplore.ieee.org
In this paper, an exhaustive study of DPDG MOSFET for analog/RF performance has been
done. DG MOSFET and DPDG MOSFET are examined through extensive 2D device …

Study on the influence of γ-ray total dose radiation effect on the electrical properties of the uniaxial strained Si nanometer NMOSFET

M Hao, H Hu, B Wang, C Liao, H Kang, H Su - Solid-State Electronics, 2017 - Elsevier
The carrier microscopic transport process of uniaxial strained Si n-channel metal-oxide
semiconductor field-effect transistor (NMOSFET) has been analyzed under γ-ray radiation …

Total ionizing dose radiation effect on the threshold voltage for the uniaxial strained Si nano NMOSFET

M Hao, H Hu, C Liao, H Kang, H Su… - IEICE Electronics …, 2017 - jstage.jst.go.jp
The carrier microscopic transport process of uniaxial strained Si n-channel metal-oxide-
semiconductor field-effect transistor (NMOSFET) has been analyzed under γ-ray radiation …

Design and analysis of ultra-thin dielectric film embedded nanoscale double-gate MOSFETs for boosting logic performance

D Roy, A Biswas - AEU-International Journal of Electronics and …, 2021 - Elsevier
This paper presents a systematic study on the performance of double gate (DG)-MOSFETs
with an ultrathin embedded dielectric film (DF) at the center of the channel from the source to …

Analytical modeling and performance characterization of a double gate MOSFET with dielectric pockets incorporating work function engineered binary metal alloy gate …

R Saha, S Sarkhel, SK Sarkar - IETE Technical Review, 2018 - Taylor & Francis
In this work, double gate MOSFET with dielectric pocket has been proposed by incorporating
the concept of gate work function engineering. A comparative analysis of this proposed …

Dielectric pocket (DP) based channel region of the junction-less dual material double gate (JLDMDG) MOSFET for enhanced analog/RF performance

A Kumar, A Gupta, S Rai - Advances in VLSI, Communication, and Signal …, 2020 - Springer
In this paper, Dielectric pocket (DP) based channel region of the junction-less dual material
double gate (JLDMDG) MOSFET is proposed. A comparative analysis of the JLDMDG and …

[PDF][PDF] Analytical study of MOS devices for leakage reduction in low power circuit

P Kumar - 2021 - dspace-jcboseust.refread.com
The transistor is the elementary unit of all the electronic systems. The advancements in the
performance of these systems have changed the world. In the recent years, the development …