Unified RTN and BTI statistical compact modeling from a defect-centric perspective
G Pedreira, J Martin-Martinez, P Saraza-Canflanca… - Solid-State …, 2021 - Elsevier
In nowadays deeply scaled CMOS technologies, time-dependent variability effects have
become important concerns for analog and digital circuit design. Transistor parameter shifts …
become important concerns for analog and digital circuit design. Transistor parameter shifts …
Circuit reliability prediction: challenges and solutions for the device time-dependent variability characterization roadblock
M Nafria, J Diaz-Fortuny… - 2021 IEEE Latin …, 2021 - ieeexplore.ieee.org
The characterization of the MOSFET Time-Dependent Variability (TDV) can be a
showstopper for reliability-aware circuit design in advanced CMOS nodes. In this work, a …
showstopper for reliability-aware circuit design in advanced CMOS nodes. In this work, a …
CMOS characterization and compact modelling for circuit reliability simulation
J Diaz-Fortuny, J Martin-Martinez… - 2018 IEEE 24th …, 2018 - ieeexplore.ieee.org
With nowadays nanometer-CMOS technologies, time-zero and time dependent variability
effects (like BTI, CHI, RTN, TDDB, EM, etc) have turned into an even more serious threat to …
effects (like BTI, CHI, RTN, TDDB, EM, etc) have turned into an even more serious threat to …
Employing the Empirical Mode Decomposition to Denoise the Random Telegraph Noise
Random Telegraph Noise (RTN) is a stochastic phenomenon which leads to characteristic
variations in electronic devices. Finding features of this signal may result in its modeling and …
variations in electronic devices. Finding features of this signal may result in its modeling and …
Contribution to the Physical Modelling of Single Charged Defects Causing the Random Telegraph Noise in Junctionless FinFET
In this paper, different physical models of single trap defects are considered, which are
localized in the oxide layer or at the oxide–semiconductor interface of field effect transistors …
localized in the oxide layer or at the oxide–semiconductor interface of field effect transistors …
[PDF][PDF] Advanced characterization methodologies of the time dependent variability in CMOS technologies
GP Rincón, JM Martínez, MN Maqueda - ddd.uab.cat
Primer de tot, donar les gracies als meus dos directors, la Dra. Montserrat Nafría Maqueda i
el Dr. Javier Martín Martínez. Ambdós heu sigut una font d'inspiració i us vull comunicar el …
el Dr. Javier Martín Martínez. Ambdós heu sigut una font d'inspiració i us vull comunicar el …
[图书][B] A versatile framework for the statistical characterization of CMOS time-zero and time-dependent variability with array-based ICs
J Diaz-Fortuny - 2019 - ddd.uab.cat
Since the invention in 1960 of the Metal Oxide Semiconductor Field Effect Transistor
(MOSFET), the CMOS semiconductor industry has invariably invented new feats to …
(MOSFET), the CMOS semiconductor industry has invariably invented new feats to …
[PDF][PDF] Study of dependencies on the operating conditions of RTN signals in nanoelectronic CMOS devices
GEE de Telecomunicació - ddd.uab.cat
Objectives Within the current landscape of CMOS electronic device research, the
understanding and mitigation of reliability issues play a pivotal role in enhancing their long …
understanding and mitigation of reliability issues play a pivotal role in enhancing their long …
[引用][C] Study of variability phenomena on CMOS technologies for its mitigation and exploitation
P Sarazá Canflanca - 2021