While chemically amplified resists (CARs) have been dominating the semiconductor
industries over the past few decades, particularly in the area of computer chip fabrication …

The development of a sustainable process for producing high-performance photoresists is
desirable yet challenging. In this study, we proposed an ionic liquid (IL)-assisted approach …

Computers and other electronic devices are an integral and ubiquitous part of the modern
world. One of the key drivers for the development, power, cost, and availability of these …

Nonchemically amplified resists (n-CARs) based on oxime sulfonate-functionalized
polystyrene (PSOS) were designed and prepared. The component ratios of the oxime …

A novel, non-chemically amplified negative resist was synthesized and characterized for
next generation lithography applications. This resist material was shown to be directly …

Although extreme ultraviolet (EUV) lithography is being considered as one of the most
promising next-generation lithography techniques for patterning sub-20 nm features, the …

A new photoacid generator (PAG) bound polymer containing triphenylsulfonium salt
methacrylate (TPSMA) was synthesized and characterized. The PAG bound polymer was …

Molecular resist materials for electron beam lithography have received significant interest as
a route to reducing line width roughness and improving resolution. However, they have often …

Electron beam lithography is a powerful technique for the production of nanostructures but
pattern quality depends on numerous interacting process variables. Orthogonal gradients of …

We utilize UV light for the attainment of high‐resolution, electronically active patterns in [6, 6]‐
phenyl C61‐butyric acid methyl ester (PCBM) films. The patterns are created by directly …