Hexaarylbenzene: evolution of properties and applications of multitalented scaffold

V Vij, V Bhalla, M Kumar - Chemical Reviews, 2016 - ACS Publications
The easily rotatable peripheral aromatic rings around central benzene in hexaarylbenzene
(HAB) derivatives create a very intriguing nonplanar, propeller-shaped geometry. Because …

3D micro‐and nanostructures via interference lithography

JH Jang, CK Ullal, M Maldovan… - Advanced Functional …, 2007 - Wiley Online Library
Interference lithography (IL) holds the promise of fabricating large‐area, defect‐free 3D
structures on the submicrometer scale both rapidly and cheaply. A stationary spatial …

Development of new advanced resist materials for microlithography

H Ito - Journal of Photopolymer Science and Technology, 2008 - jstage.jst.go.jp
抄録 This paper reviews development of advanced resist materials which I have been
involved in for more than a quarter century. First, our attempts to increase the main chain …

Molecular Glass Resists as High‐Resolution Patterning Materials

A De Silva, NM Felix, CK Ober - Advanced Materials, 2008 - Wiley Online Library
The success of the semiconductor industry is based on the ability to fabricate hundreds of
millions of devices on a single chip. In order to fulfill the ever‐shrinking feature sizes, the …

Acid-sensitive semiperfluoroalkyl resorcinarene: an imaging material for organic electronics

JK Lee, M Chatzichristidi, AA Zakhidov… - Journal of the …, 2008 - ACS Publications
Acid-Sensitive Semiperfluoroalkyl Resorcinarene: An Imaging Material for Organic Electronics |
Journal of the American Chemical Society ACS ACS Publications C&EN CAS Find my …

Study of the Structure− Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography

A De Silva, JK Lee, X André, NM Felix… - Chemistry of …, 2008 - ACS Publications
In this paper, we report the synthesis and characterization of a family of phenolic molecular
glasses with variable size and branch architecture. This research is aimed at providing an …

Tailoring polymer microstructure for the mitigation of the pattern collapse in sub-10 nm EUV lithography: Multiscale simulation study

M Kim, S Park, J Choi, J Moon, M Cho - Applied Surface Science, 2021 - Elsevier
Photoresist (PR) nanopatterning using extreme-ultraviolet-lithography (EUVL) drives
significant advances in integrated-circuit downsizing; however, sub-10 nm nodes severely …

Supramolecular nanomimetics: replication of micelles, viruses, and other naturally occurring nanoscale objects

BW Maynor, I LaRue, Z Hu, JP Rolland, A Pandya… - Small, 2007 - Wiley Online Library
Naturally occurring supramolecular objects, such as proteins, micelles, and viruses, exhibit
sophisticated morphological shapes or surface motifs that conventional synthetic and …

Novel extreme ultraviolet (EUV)-resist material based on noria (water wheel-like cyclic oligomer)

H Kudo, Y Suyama, H Oizumi, T Itani… - Journal of Materials …, 2010 - pubs.rsc.org
The synthesis and properties of noria derivatives (noria-ADs) with pendant adamantate (AD)
groups were examined to assess the suitability of these compounds for application as …

Dry photolithographic patterning process for organic electronic devices using supercritical carbon dioxide as a solvent

HS Hwang, AA Zakhidov, JK Lee, X André… - Journal of Materials …, 2008 - pubs.rsc.org
The particular challenge of micropatterning organic materials has stimulated numerous
approaches for making effective and repeatable patterned structures with fine features …