Filtered cathodic vacuum arc was used to synthesize ultrathin carbon films on silicon
substrates. The depth profiles, near-surface chemical composition, fractions of tetrahedral …

Surface modification of a magnetic recording medium was accomplished by filtered cathodic
vacuum arc (FCVA). The carbon overcoat of thin-film disks was removed by Ar+ ion sputter …

Atomic level quantities are valuable tools in probing the local structural characteristics of
amorphous materials. In this paper, we utilize the concept of atomic level stresses to study …

We review the implementation of X-ray reflection (reflectivity and scattering) techniques for
the study of amorphous Carbon (aC, aC: H, ta-C) thin and multilayer films and in particular in …

We propose a new path for preparing nanostructured carbon films (NCFs) by using electron
cyclotron resonance (ECR) plasma sputtering with ion-electron hybrid irradiation for …

We have studied the problem of intrinsic stress in tetrahedral amorphous carbon. Our
methodology was based on the concept of atomic level stresses. These are extracted from …

Transmission electron microscopy (TEM) and analytic TEM were used to study the
microstructure of amorphous carbon (aC) films of thickness in the range of 5–100 nm …

In this work, the synthesis and characterization of hydrogenated diamond-like carbon
(HDLC) nanocomposite thin films with embedded metallic Ag and Cu nanoparticles (NPs) …

The kinetics of carbon sputter deposition on Si (100) substrates were studied by
spectroscopic ellipsometry (SE) and X-ray reflectivity (XRR). The energy of ions bombarding …

Submicrometer-thick hard carbon films were deposited on smooth Si (100) substrates by
radio frequency sputtering. To avoid the development of high residual stresses during film …