Numerical Validation of Analytical Solutions for the Kairat Evolution Equation

MMA Khater - International Journal of Theoretical Physics, 2024 - Springer
This study undertakes a comprehensive analytical and numerical investigation of the
nonlinear Kairat model, a significant evolution equation that governs a wide range of …

EUV and DUV scatterometry for CD and edge profile metrology on EUV masks

B Bodermann, M Wurm, A Diener… - 25th European mask …, 2009 - ieeexplore.ieee.org
To test the applicability of scatterometry on EUV masks we measured a prototype EUV mask
both with an EUV scatterometer and a conventional scatterometer operated at 193 nm and …

An integrated analytical–numerical framework for studying nonlinear PDEs: The GBF case study

MMA Khater - Modern Physics Letters B, 2024 - World Scientific
In this study, we investigate the complex dynamics of the (1+ 1)-dimensional generalized
Burgers–Fisher (GBF) model, a nonlinear partial differential equation that encapsulates the …

Nonlinear evolution equations in dispersive media: Analyzing the semilinear dispersive-fisher model

R Altuijri, AH Abdel-Aty, KS Nisar… - International Journal of …, 2025 - ui.adsabs.harvard.edu
Abstract The nonlinear Semilinear Dispersive-Fisher (SDF) model is an important equation
describing wave dynamics in dispersive media influenced by nonlinear and diffusive effects …

A scatterometry inverse problem in optical mask metrology

R Model, A Rathsfeld, H Gross, M Wurm… - Journal of Physics …, 2008 - iopscience.iop.org
We discuss the solution of the inverse problem in scatterometry ie the determination of
periodic surface structures from light diffraction patterns. With decreasing details of …

Interpretation of azimuthal angle dependence of periodic gratings in Mueller matrix spectroscopic ellipsometry

A Heinrich, J Bischoff, K Meiner, U Richter, T Mikolajick… - JOSA A, 2015 - opg.optica.org
Mueller matrix spectroscopic ellipsometry becomes increasingly important for determining
structural parameters of periodic line gratings. Because of the anisotropic character of …

Über die dimensionelle Charakterisierung von Gitterstrukturen auf Fotomasken mit einem neuartigen DUV-Scatterometer

M Wurm - 2008 - db-thueringen.de
Mit einem Scatterometer wird die an einer Probe gebeugte bzw. gestreute Strahlung
analysiert, ohne abbildende Optiken (Objektive) einzusetzen. Die Messungen sind …

Computational methods estimating uncertainties for profile reconstruction in scatterometry

H Gross, A Rathsfeld, F Scholze… - Optical Micro-and …, 2008 - spiedigitallibrary.org
The solution of the inverse problem in scatterometry, ie the determination of periodic surface
structures from light diffraction patterns, is incomplete without knowledge of the uncertainties …

First steps towards traceability in scatterometry

F Scholze, B Bodermann, H Groß… - 27th European Mask …, 2011 - spiedigitallibrary.org
Scatterometry is a common technique for the characterization of nano-structured surfaces.
The goal is to establish scatterometry as a traceable and absolute metrological method for …

Photomask CD and LER characterization using Mueller matrix spectroscopic ellipsometry

A Heinrich, I Dirnstorfer, J Bischoff… - … European Mask and …, 2014 - spiedigitallibrary.org
Critical dimension and line edge roughness on photomask arrays are determined with
Mueller matrix spectroscopic ellipsometry. Arrays with large sinusoidal perturbations are …