A review of recent advances in fabrication of optical Fresnel lenses
Fresnel lenses are important compact optical components, which are comprised of multiple
faceted concentric rings. These lenses are the most widely utilized diffractive optical element …
faceted concentric rings. These lenses are the most widely utilized diffractive optical element …
[HTML][HTML] Assessing tolerances in direct write laser grayscale lithography and reactive ion etching pattern transfer for fabrication of 2.5 D Si master molds
Abstract Direct Write Laser (DWL) Grayscale (GS) lithography has gathered attention as a
versatile technological solution to fabricate arbitrary and complex 2.5 D structures in …
versatile technological solution to fabricate arbitrary and complex 2.5 D structures in …
Two-step photolithography to fabricate multilevel microchannels
In this paper, we study the variation of the thickness of patterned microchannel features in
photoresist (PR) by two-step photolithography. The final PR thickness is determined by the …
photoresist (PR) by two-step photolithography. The final PR thickness is determined by the …
Rigorous model-based mask data preparation algorithm applied to grayscale lithography for the patterning at the micrometer scale
P Chevalier, P Quéméré… - Journal of …, 2021 - ieeexplore.ieee.org
Grayscale mask creation has for the most part been restricted to over-simplified optical and
resist models usually based on a contrast curve approach. While this technique has proven …
resist models usually based on a contrast curve approach. While this technique has proven …
Grayscale lithography—automated mask generation for complex three-dimensional topography
J Loomis, D Ratnayake, C McKenna… - Journal of Micro …, 2016 - spiedigitallibrary.org
Grayscale lithography is a relatively underutilized technique that enables fabrication of three-
dimensional (3-D) microstructures in photosensitive polymers (photoresists). By spatially …
dimensional (3-D) microstructures in photosensitive polymers (photoresists). By spatially …
[HTML][HTML] A compact low-cost low-maintenance open architecture mask aligner for fabrication of multilayer microfluidics devices
A custom-built mask aligner (CBMA), which fundamentally covers all the key features of a
commercial mask aligner, while being low cost and light weight and having low power …
commercial mask aligner, while being low cost and light weight and having low power …
One-step fabrication of microchannels with integrated three dimensional features by hot intrusion embossing
We build on the concept of hot intrusion embossing to develop a one-step fabrication
method for thermoplastic microfluidic channels containing integrated three-dimensional …
method for thermoplastic microfluidic channels containing integrated three-dimensional …
Dose influence on the PMMA e-resist for the development of high-aspect ratio and reproducible sub-micrometric structures by electron beam lithography
A Veroli, F Mura, M Balucani, R Caminiti - AIP Conference …, 2016 - pubs.aip.org
In this work, a statistical process control method is presented showing the accuracy and the
reliability obtained with of PMMA E-resist AR-P 672, using an Elphy Quantum Electron Beam …
reliability obtained with of PMMA E-resist AR-P 672, using an Elphy Quantum Electron Beam …
Multi-step etching of three-dimensional sub-millimeter curved silicon microstructures with in-plane principal axis
We report a micromachining method for batch fabrication of three-dimensional curved
microstructures exhibiting in-plane principal axis with respect to the wafer substrate. The …
microstructures exhibiting in-plane principal axis with respect to the wafer substrate. The …
Maskless grayscale lithography using a positive-tone photodefinable polyimide for MEMS applications
JH Lake, SD Cambron, KM Walsh… - Journal of …, 2011 - ieeexplore.ieee.org
The novel use of a positive-tone photosensitive polyimide for the rapid production of
grayscale features using a maskless lithography system is demonstrated. The removal rate …
grayscale features using a maskless lithography system is demonstrated. The removal rate …