The evolution of silicon cryoetching is reported in this topical review, from its very first
introduction by a Japanese team to today's advanced technologies. The main advances in …

Low-temperature radio frequency plasmas are essential in various sectors of advanced
technology, from micro-engineering to spacecraft propulsion systems and efficient sources …

In this article, we give an overview about the chemical and physical processes that play a
role in etching at lower wafer temperatures. Conventionally, plasma etching processes rely …

This paper presents the results of an in-depth study of the plasma-chemical etching (PCE)
process of single-crystal silicon carbide (SiC) in SF 6/O 2 inductively coupled plasma (ICP) …

Silicon nitride (Si3N4) etching using CF4/O2 mixed with N2 has become very popular in 3D
NAND flash structures. However, studies on Si3N4 dry etching based on optical emission …

Optical emission spectroscopy is informative and nondisturbing technique for diagnostics of
various plasmas used for material treatment. In this work the distinctive features of emission …

Тенденции развития современной технологии электронной техники заключаются в
увеличении степени интеграции изделий на поверхности подложек, что связано как с …

A variety of materials can be etched in SF 6/O 2 plasmas. Here, the fate of SO 2 at Si and
SiO 2 surfaces during etching in SF 6/O 2 plasmas has been explored using the imaging of …

Questo lavoro si focalizza nella descrizione fisica dei plasmi a bassa temperatura. Si riporta
un'introduzione nella quale essi vengono descritti. Viene fornito un elenco di una serie di …

En este trabajo se estudia la utilización de grabado anisotrópico y SRO con la finalidad de
mejorar el rendimiento de las guías de onda coplanares. Se presentan resultados …