Virtual metrology as an approach for product quality estimation in Industry 4.0: a systematic review and integrative conceptual framework

PA Dreyfus, F Psarommatis, G May… - International Journal of …, 2022 - Taylor & Francis
Virtual metrology (VM) involves estimating a product's quality directly from production
process data without physically measuring it. This enables the product quality of each unit of …

Virtual metrology in semiconductor manufacturing: Current status and future prospects

V Maitra, Y Su, J Shi - Expert Systems with Applications, 2024 - Elsevier
Abstract Advanced Process Control (APC) has become an increasingly pressing issue for
the semiconductor industry, particularly in the new era of sub-5nm process technology. To …

Decision-based virtual metrology for advanced process control to empower smart production and an empirical study for semiconductor manufacturing

CF Chien, WT Hung, CW Pan… - Computers & Industrial …, 2022 - Elsevier
Virtual metrology (VM) has been employed to improve the performance of advanced process
control for semiconductor manufacturing. A number of VM models have been proposed to …

Adaptive virtual metrology for semiconductor chemical mechanical planarization process using GMDH-type polynomial neural networks

X Jia, Y Di, J Feng, Q Yang, H Dai, J Lee - Journal of Process Control, 2018 - Elsevier
Virtual metrology (VM) is drawing more and more attention in the recent research of wafer to
wafer control for semiconductor manufacturing. Although many different approaches for VM …

Ranking station importance with human mobility patterns using subway network datasets

F Xia, J Wang, X Kong, D Zhang… - IEEE Transactions on …, 2019 - ieeexplore.ieee.org
Complex networks have become an active interdisciplinary field of research inspired by the
empirical study of various networks. A subway network is a real-world example of complex …

Recurrent feature-incorporated convolutional neural network for virtual metrology of the chemical mechanical planarization process

KB Lee, CO Kim - Journal of Intelligent Manufacturing, 2020 - Springer
In semiconductor manufacturing, the chemical mechanical planarization (CMP) process
produces higher thickness variability in the edge area of the wafer than that in the center …

Milling force modeling of worn tool and tool flank wear recognition in end milling

Y Hou, D Zhang, B Wu, M Luo - IEEE/ASME Transactions on …, 2014 - ieeexplore.ieee.org
The wear state of a cutting tool is an important factor which affects machining quality.
Therefore, monitoring tool wear is extremely essential to ensure workpiece quality and …

A layer-to-layer model and feedback control of ink-jet 3-D printing

L Lu, J Zheng, S Mishra - Ieee/asme Transactions on …, 2014 - ieeexplore.ieee.org
Ink-jet 3-D printing is a promising additive manufacturing technology with the potential for
impacting a wide variety of industries. In typical ink-jet 3-D printing, the part is built up by …

Prediction by a hybrid machine learning model for high-mobility amorphous In2O3: Sn films fabricated by RF plasma sputtering deposition using a nitrogen-mediated …

K Kamataki, H Ohtomo, N Itagaki, CF Lesly… - Journal of Applied …, 2023 - pubs.aip.org
In this study, we developed a hybrid machine learning technique by combining appropriate
classification and regression models to address challenges in producing high-mobility …

Adaptive virtual metrology method based on Just-in-time reference and particle filter for semiconductor manufacturing

H Cai, J Feng, F Zhu, Q Yang, X Li, J Lee - Measurement, 2021 - Elsevier
The prediction of the average Material Removal Rate (MRR) for Chemical Mechanical
Planarization (CMP) process has been recognized to be a critical factor of Virtual Metrology …