Virtual metrology as an approach for product quality estimation in Industry 4.0: a systematic review and integrative conceptual framework
PA Dreyfus, F Psarommatis, G May… - International Journal of …, 2022 - Taylor & Francis
Virtual metrology (VM) involves estimating a product's quality directly from production
process data without physically measuring it. This enables the product quality of each unit of …
process data without physically measuring it. This enables the product quality of each unit of …
Virtual metrology in semiconductor manufacturing: Current status and future prospects
Abstract Advanced Process Control (APC) has become an increasingly pressing issue for
the semiconductor industry, particularly in the new era of sub-5nm process technology. To …
the semiconductor industry, particularly in the new era of sub-5nm process technology. To …
Decision-based virtual metrology for advanced process control to empower smart production and an empirical study for semiconductor manufacturing
Virtual metrology (VM) has been employed to improve the performance of advanced process
control for semiconductor manufacturing. A number of VM models have been proposed to …
control for semiconductor manufacturing. A number of VM models have been proposed to …
Adaptive virtual metrology for semiconductor chemical mechanical planarization process using GMDH-type polynomial neural networks
Virtual metrology (VM) is drawing more and more attention in the recent research of wafer to
wafer control for semiconductor manufacturing. Although many different approaches for VM …
wafer control for semiconductor manufacturing. Although many different approaches for VM …
Ranking station importance with human mobility patterns using subway network datasets
Complex networks have become an active interdisciplinary field of research inspired by the
empirical study of various networks. A subway network is a real-world example of complex …
empirical study of various networks. A subway network is a real-world example of complex …
Recurrent feature-incorporated convolutional neural network for virtual metrology of the chemical mechanical planarization process
KB Lee, CO Kim - Journal of Intelligent Manufacturing, 2020 - Springer
In semiconductor manufacturing, the chemical mechanical planarization (CMP) process
produces higher thickness variability in the edge area of the wafer than that in the center …
produces higher thickness variability in the edge area of the wafer than that in the center …
Milling force modeling of worn tool and tool flank wear recognition in end milling
Y Hou, D Zhang, B Wu, M Luo - IEEE/ASME Transactions on …, 2014 - ieeexplore.ieee.org
The wear state of a cutting tool is an important factor which affects machining quality.
Therefore, monitoring tool wear is extremely essential to ensure workpiece quality and …
Therefore, monitoring tool wear is extremely essential to ensure workpiece quality and …
A layer-to-layer model and feedback control of ink-jet 3-D printing
Ink-jet 3-D printing is a promising additive manufacturing technology with the potential for
impacting a wide variety of industries. In typical ink-jet 3-D printing, the part is built up by …
impacting a wide variety of industries. In typical ink-jet 3-D printing, the part is built up by …
Prediction by a hybrid machine learning model for high-mobility amorphous In2O3: Sn films fabricated by RF plasma sputtering deposition using a nitrogen-mediated …
K Kamataki, H Ohtomo, N Itagaki, CF Lesly… - Journal of Applied …, 2023 - pubs.aip.org
In this study, we developed a hybrid machine learning technique by combining appropriate
classification and regression models to address challenges in producing high-mobility …
classification and regression models to address challenges in producing high-mobility …
Adaptive virtual metrology method based on Just-in-time reference and particle filter for semiconductor manufacturing
The prediction of the average Material Removal Rate (MRR) for Chemical Mechanical
Planarization (CMP) process has been recognized to be a critical factor of Virtual Metrology …
Planarization (CMP) process has been recognized to be a critical factor of Virtual Metrology …