Physical vapor deposition (PVD) is a thin film fabrication process in the semiconductor
industry. This review paper discusses the different types of PVD methods such as sputtering …

During actual vehicle applications, the condition of start-up/shut-down generates high
cathodic potential, causing the anodic dissolution and having a great impact on the lifetime …

To further enhance the performance of metal bipolar plates, the CrAlCN coating with high
corrosion resistance and conductivity was deposited on the SS316L substrate by using …

Thin films of several transition metal oxynitrides such as titanium, zirconium, hafnium,
niobium and tantalum oxynitride have been produced at room temperature by direct current …

Ti-Cr-N coatings were deposited on Si (100) and AISI D2 tool steel substrates by reactive
DC magnetron co-sputtering technique from titanium and chromium target in mixed Ar/N 2 …

The main objective of this work is the preparation of decorative zirconium oxynitride, Zr O x N
y⁠, thin films by dc reactive magnetron sputtering. Film properties were analyzed as a …

This work is devoted to the investigation of decorative zirconium oxynitride, Zr O x N y⁠, films
prepared by dc reactive magnetron sputtering, using a 17: 3 nitrogen-to-oxygen-ratio gas …

The transition metal oxynitrides are a coating material with decorative features due to their
adjustable color and good mechanical properties. The purpose of the research was to study …

Thin films of zirconium oxynitride (ZrNO) and titanium oxynitride (TiNO) have been deposited
onto Si (100) substrates at room temperature by radiofrequency magnetron sputtering in an …

Titanium oxynitride coatings (TiN x O y) are considered a promising material for applications
in dental implantology due to their high corrosion resistance, their biocompatibility and their …