Low-temperature radio frequency plasmas are essential in various sectors of advanced
technology, from micro-engineering to spacecraft propulsion systems and efficient sources …

Optical diagnostics are between the most commonly used tools for the characterization of
plasmas and for the better understanding of physical and chemical processes controlling …

High-index contrast silicon-on-insulator technology enables wavelength-scale compact
photonic circuits. We report fabrication of photonic circuits in silicon-on-insulator using …

Most naturally existing superhydrophobic surfaces have a dual roughness structure where
the entire microtextured area is covered with nanoscale roughness. Despite numerous …

Silicon etching in Cl 2-based plasmas is an important step for the fabrication of IC circuits but
the plasma surface interactions involved in this process remain poorly understood. Based on …

One major challenge in plasma etching processes for integrated circuit fabrication is to
achieve a good wafer-to-wafer repeatability. This requires a perfect control of the plasma …

An efficient method for the synthesis of the first N‐heterocyclic carbene (NHC)‐stabilized
halosilylidyne complexes is reported that starts from SiBr4. In the first step, SiBr4 was treated …

Plasma oxidation of the c-Si substrate through a very thin gate oxide layer can be observed
during HBr/O 2/Ar based plasma overetch steps of gate etch processes. This phenomenon …

The authors used atomic force microscopy to analyze the roughness generated on c-Si
(100) surfaces when etched in high-density plasmas over a wide range of conditions …

The thermal stability of superhydrophobic, nanostructured surfaces after thermal annealing
was explored. Flat surfaces coated with hydrophobic diamond-like carbon (DLC) via plasma …