Si–Ge–Sn alloys: From growth to applications

S Wirths, D Buca, S Mantl - Progress in crystal growth and characterization …, 2016 - Elsevier
In this review article, we address key material parameters as well as the fabrication and
application of crystalline GeSn binary and SiGeSn ternary alloys. Here, the transition from an …

Recent progress in GeSn growth and GeSn-based photonic devices

J Zheng, Z Liu, C Xue, C Li, Y Zuo… - Journal of …, 2018 - iopscience.iop.org
The GeSn binary alloy is a new group IV material that exhibits a direct bandgap when the Sn
content exceeds 6%. It shows great potential for laser use in optoelectronic integration …

Demonstration of a Ge/GeSn/Ge quantum-well microdisk resonator on silicon: enabling high-quality Ge (Sn) materials for micro-and nanophotonics

R Chen, S Gupta, YC Huang, Y Huo, CW Rudy… - Nano …, 2014 - ACS Publications
We theoretically study and experimentally demonstrate a pseudomorphic Ge/Ge0. 92Sn0.
08/Ge quantum-well microdisk resonator on Ge/Si (001) as a route toward a compact GeSn …

Progress on germanium–tin nanoscale alloys

J Doherty, S Biswas, E Galluccio… - Chemistry of …, 2020 - ACS Publications
Group IV alloys have attracted interest in the drive to create Si compatible, direct band gap
materials for implementation in complementary metal oxide semiconductor (CMOS) and …

Highly Selective Dry Etching of Germanium over Germanium–Tin (Ge1–xSnx): A Novel Route for Ge1–xSnx Nanostructure Fabrication

S Gupta, R Chen, YC Huang, Y Kim, E Sanchez… - Nano …, 2013 - ACS Publications
We present a new etch chemistry that enables highly selective dry etching of germanium
over its alloy with tin (Ge1–x Sn x). We address the challenges in synthesis of high-quality …

GeSn Waveguide Photodetectors with Vertical p–i–n Heterostructure for Integrated Photonics in the 2 μm Wavelength Band

CH Liu, R Bansal, CW Wu, YT Jheng… - Advanced Photonics …, 2022 - Wiley Online Library
The 2 μm wavelength band (1800–2100 nm) emerges as a promising candidate for next‐
generation optical communication. As a result, silicon photonic platforms acquire great …

GeSn quantum well p-channel tunneling FETs fabricated on Si (001) and (111) with improved subthreshold swing

G Han, Y Wang, Y Liu, C Zhang, Q Feng… - IEEE Electron …, 2016 - ieeexplore.ieee.org
Ultrathin GeSn channels were epitaxially grown on Si (111) and (001) substrates using solid
source molecular beam epitaxy. Well-behaved GeSn quantum well (QW) pTFETs and …

Silicon-based silicon–germanium–tin heterostructure photonics

R Soref - Philosophical Transactions of the Royal Society …, 2014 - royalsocietypublishing.org
The wavelength range that extends from 1550 to 5000 nm is a new regime of operation for
Si-based photonic and opto-electronic integrated circuits. To actualize the new chips …

New materials for post-Si computing: Ge and GeSn devices

S Gupta, X Gong, R Zhang, YC Yeo, S Takagi… - MRS …, 2014 - cambridge.org
As Si-transistor technology advances beyond the 10 nm node, the device research
community is increasingly looking into the possibility of replacing Si with novel, high mobility …

Impact of strain engineering and Sn content on GeSn heterostructured nanomaterials for nanoelectronics and photonic devices

MA Nawwar, MSA Ghazala, LMS El-Deen… - RSC …, 2022 - pubs.rsc.org
Heterostructures based on the GeSn nanocompound have high impact on integrated
photonics devices. The promising feature of GeSn nanostructures is its direct bandgap …