[图书][B] Sub-threshold design for ultra low-power systems

A Wang, BH Calhoun, AP Chandrakasan - 2006 - Springer
Although energy dissipation has improved with each new technology node, because SoCs
are integrating tens of million devices on-chip, the energy expended per operation has …

A 256-kb 65-nm sub-threshold SRAM design for ultra-low-voltage operation

BH Calhoun, AP Chandrakasan - IEEE journal of solid-state …, 2007 - ieeexplore.ieee.org
Low-voltage operation for memories is attractive because of lower leakage power and active
energy, but the challenges of SRAM design tend to increase at lower voltage. This paper …

A 256 kb 65 nm 8T subthreshold SRAM employing sense-amplifier redundancy

N Verma, AP Chandrakasan - IEEE Journal of Solid-State …, 2008 - ieeexplore.ieee.org
Aggressively scaling the supply voltage of SRAMs greatly minimizes their active and
leakage power, a dominating portion of the total power in modern ICs. Hence, energy …

A 256kb sub-threshold SRAM in 65nm CMOS

BH Calhoun, A Chandrakasan - 2006 IEEE International Solid …, 2006 - ieeexplore.ieee.org
A 256kb sub-threshold SRAM operates below 400mV from 0 to 85° C and is implemented in
65nm CMOS technology. For the same 6sigma static-noise margin, the sub-threshold SRAM …

High-performance SRAM in nanoscale CMOS: Design challenges and techniques

CT Chuang, S Mukhopadhyay, JJ Kim… - … , design and testing, 2007 - ieeexplore.ieee.org
This paper reviews the design challenges and techniques of high-performance SRAM in the
“End of Scaling” nanoscale CMOS technologies. The impacts of technology scaling, such as …

An SRAM design in 65-nm technology node featuring read and write-assist circuits to expand operating voltage

H Pilo, C Barwin, G Braceras… - IEEE Journal of solid …, 2007 - ieeexplore.ieee.org
This paper describes a 32-Mb SRAM that has been designed and fabricated in a 65-nm low-
power CMOS Technology. The 62-mm 2 die features read-assist and write-assist circuit …

A 16 nm 128 Mb SRAM in High- Metal-Gate FinFET Technology With Write-Assist Circuitry for Low-VMIN Applications

YH Chen, WM Chan, WC Wu, HJ Liao… - IEEE Journal of Solid …, 2014 - ieeexplore.ieee.org
A 128 Mb 0.07 μm 2 6T high-density SRAM bitcell with write-assist circuitry has been
successfully implemented using 16 nm high-k metal gate FinFET technology. This study …

A 5-nm 135-mb SRAM in EUV and high-mobility channel FinFET technology with metal coupling and charge-sharing write-assist circuitry schemes for high-density …

TYJ Chang, YH Chen, WM Chan… - IEEE Journal of Solid …, 2020 - ieeexplore.ieee.org
A 135-Mb 0.021-μm 2 6-T high-density SRAM bit cell with write-assist circuitries was
successfully implemented by using 5-nm HK-metal gate FinFET with EUV and high-mobility …

A 130 mV SRAM with expanded write and read margins for subthreshold applications

MF Chang, SW Chang, PW Chou… - IEEE Journal of Solid …, 2010 - ieeexplore.ieee.org
SRAM suffers read-disturb and write failures at a low supply voltage, especially at deep
subthreshold operation. This study proposes a 9T-SRAM cell with a data-aware-feedback …

A 250 mV 8 kb 40 nm ultra-low power 9T supply feedback SRAM (SF-SRAM)

A Teman, L Pergament, O Cohen… - IEEE Journal of Solid …, 2011 - ieeexplore.ieee.org
Low voltage operation of digital circuits continues to be an attractive option for aggressive
power reduction. As standard SRAM bitcells are limited to operation in the strong-inversion …