Reverse side engineered III-nitride devices

R Chu, U Mishra, RK Lal - US Patent 8,389,977, 2013 - Google Patents
Group III-nitride devices are described that include a stack of III-nitride layers, passivation
layers, and conductive contacts. The stack includes a channel layer with a 2DEG channel, a …

Enhancement Mode III-N HEMTs

U Mishra, R Coffie, L Shen, I Ben-Yaacov… - US Patent …, 2013 - Google Patents
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Semiconductor devices with field plates

R Chu, R Coffie - US Patent 8,390,000, 2013 - Google Patents
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Gallium nitride diodes and integrated components

CS Suh, J Honea, U Mishra - US Patent App. 11/856,695, 2009 - Google Patents
(57) ABSTRACT A diode device can include an enhancement mode gallium nitride
transistor having a gate, a drain and a source, wherein the gate is connected to the drain to …

Semiconductor heterostructure diodes

Y Wu, R Chu, P Parikh, U Mishra, I Ben-Yaacov… - US Patent …, 2012 - Google Patents
Planar Schottky diodes for which the semiconductor material includes a heterojunction
which induces a 2DEG in at least one of the semiconductor layers. A metal anode contact is …

Semiconductor devices with guard rings

U Mishra, S Chowdhury, Y Dora - US Patent 8,901,604, 2014 - Google Patents
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High power semiconductor electronic components with increased reliability

RK Lal, R Coffie, Y Wu, P Parikh, Y Dora… - US Patent …, 2013 - Google Patents
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2004 Smith 2003/0020092 A1 1/2003 Parikh et al. 6,849,882 B2 2/2005 Chavarkar et al …

Electrode configurations for semiconductor devices

Y Dora, Y Wu - US Patent 8,716,141, 2014 - Google Patents
Abstract A III-N semiconductor device can include an electrode-defining layer having a
thickness on a surface of a III-N material structure. The electrode-defining layer has a recess …

Enhancement-mode III-nitride devices

RK Lal - US Patent 9,087,718, 2015 - Google Patents
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JP 2010-087076 4/2010 7,875,907 B2 1/2011 Honea et al. JP 2010-539712 12/2010 …

GaN structures

DM Kinzer - US Patent 9,960,154, 2018 - Google Patents
(57) ABSTRACT A semiconductor device is disclosed. The device includes a substrate
including Gan, a two dimensional electron gas (2DEG) inducing layer on the substrate, and …