Abstract Systems and methods are disclosed for reducing the influence of plasma generated
debris on internal components of an EUV light source. In one aspect, an EUV meteorology …

The method and system herein pertain to an EUV photon source which includes a plasma
chamber filled with a gas mixture, multiple electrodes within the plasma chamber defining a …

(63) Continuation-in-part of application No. 10/384.967, filed on ment having an emission
line within a desired extreme Mar. 8, 2003, which is a continuation-in-part of application No …

The disclosure is directed to a bonding tool for use primarily in thermo-compression bonding
of electronic circuit components and to a method of making the bonding tool. In one form of …

An apparatus and method is described for effectively and efficiently providing plasma
irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial …

High density plasma is produced in a long cylindrical cavity by the excitation of a high
frequency whistler wave within the cavity. The cylindrical cavity, and hence the plasma, is …

The substrate in a plasma jet deposition system is provided with structural attributes, such as
apertures and/or grooves, that facilitate efficient deposition. Groups of substrates are …

Bollanti et al.," Compact three electrodes excimer laser IANUS for a POPA optical systems”,
SPIE Proc.(2206) 144-153,(1994). Bollanti et al.,“Ianus, the three-electrode excimer laser.” …

Matthews and Cooper,“Plasma sources for x-ray lithography,” SPIE, 333, Submicron
Lithography, pp. 136-139 (1982). Mayo, et al.,“A magnetized coaxial source facility for the …

BACKGROUND OF THE INVENTION (1) Field of the Invention The present invention relates
to a method and appara tus which provides multiple, sequential radiofrequency wave …