This article provides a brief overview of both established and novel ellipsometry techniques,
as well as their applications. Ellipsometry is an indirect optical technique, in that information …

Nanoelectronics is changing the way the world communicates, and is transforming our daily
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …

In order to control nanoimprint lithography processes to achieve good fidelity, accurate
characterization of structural parameters of nanoimprinted resist patterns is highly desirable …

The semiconductor industry continues to drive patterning solutions that enable devices with
higher memory storage capacity, faster computing performance, and lower cost per …

The quality of the measured signature is influenced not only by the instrument's precision but
also by the selected measurement configuration. In optical scatterometry, the purpose of …

In most cases of optical critical dimension metrology, when applying rigorous coupled-wave
analysis to optical modeling, a high order of Fourier harmonics is usually set up to guarantee …

We report a spectroscopic Mueller matrix experimental study of a plasmonic photonic crystal
consisting of gold hemispheroidal particles (lateral radius 54 nm, height 25 nm) arranged on …

Parametric sensitivity analysis (SA) is an essential tool in optical data analysis aiming to
quantify the relative importance of optical model parameters and identify those with a low …

Due to the rich information provided by the Mueller matrices when the most general conical
diffraction configuration is considered, the Mueller matrix polarimetry has demonstrated a …

Mueller matrix polarimetry (MMP) is introduced to characterize nanoimprinted grating
structures, and noticeable depolarization effects from measured data are observed. We …