A new design approach of dopingless tunnel FET for enhancement of device characteristics
Formation of abrupt tunneling junction for the sub-nanometer tunnel FET (TFET) is crucial for
achieving better electrical behavior. This task is more challenging in the case of dopingless …
achieving better electrical behavior. This task is more challenging in the case of dopingless …
A high-performance gate engineered InGaN dopingless tunnel FET
X Duan, J Zhang, S Wang, Y Li, S Xu… - IEEE Transactions on …, 2018 - ieeexplore.ieee.org
A gate engineered InGaN dopingless tunnel FET (DL-TFET) using the charge plasma
concept is proposed and investigated by silvaco Atlas simulation. In 0.75 Ga 0.25 N is a …
concept is proposed and investigated by silvaco Atlas simulation. In 0.75 Ga 0.25 N is a …
Doping and dopingless tunnel field effect transistor
P Singh, DP Samajdar… - 2021 6th International …, 2021 - ieeexplore.ieee.org
For Low power consumption, an emerging device that depends on lowering the supply
voltage with downscaling is proposed which is known as the Tunnel-FET (TFET). In general …
voltage with downscaling is proposed which is known as the Tunnel-FET (TFET). In general …
Interfacial trap charge and self-heating effect based reliability analysis of a Dual-Drain Vertical Tunnel FET
This manuscript exclusively addresses the reliability concern of a double-drain vertical TFET
(DD-VTFET) by analysing the influence of interface trap charges and variation in ambient …
(DD-VTFET) by analysing the influence of interface trap charges and variation in ambient …
Simulation study on ferroelectric layer thickness dependence RF/Analog and linearity parameters in ferroelectric tunnel junction TFET
R Saha - Microelectronics Journal, 2021 - Elsevier
In this paper, the impact of ferroelectric layer thickness (t FE) on input drain current
characteristic is reported in ferroelectric tunnel junction (FTJ) TFET through TCAD simulator …
characteristic is reported in ferroelectric tunnel junction (FTJ) TFET through TCAD simulator …
Impact of work function variation for enhanced electrostatic control with suppressed ambipolar behavior for dual gate L-TFET
The favorable electrostatic potential and tunneling underneath the overall gate region, which
prevents legitimate source to drain tunneling, controllability over the gate is assisted in …
prevents legitimate source to drain tunneling, controllability over the gate is assisted in …
Effect of interface trap charges on performance variation of heterogeneous gate dielectric junctionless-TFET
In this paper, we investigate the effect of interface trap charges on the variation of
heterogeneous gate dielectric junctionless-tunnel FET (JL-TFET) by introducing both donor …
heterogeneous gate dielectric junctionless-tunnel FET (JL-TFET) by introducing both donor …
Design and Investigation of Charge-Plasma-Based Work Function Engineered Dual-Metal-Heterogeneous Gate Si-Si0.55Ge0.45 GAA-Cylindrical NWTFET for …
N Kumar, A Raman - IEEE Transactions on Electron Devices, 2019 - ieeexplore.ieee.org
In this paper, we have proposed dopingless gate all around (GAA) nanowire tunnel field-
effect transistor (NWTFET) made up of dual-material channel (DMaC). Charge-plasma (CP) …
effect transistor (NWTFET) made up of dual-material channel (DMaC). Charge-plasma (CP) …
Impact of band gap and gate dielectric engineering on novel Si0. 1Ge0. 9-GaAs lateral N-type charge plasma based JLTFET
K Kumar, SC Sharma - Microelectronics Journal, 2022 - Elsevier
In this research article, a device called dual dielectric gate hetero-material junctionless TFET
(DD-HJLTFET) is proposed using a novel amalgamation of Si 0.1 Ge 0.9/GaAs for the first …
(DD-HJLTFET) is proposed using a novel amalgamation of Si 0.1 Ge 0.9/GaAs for the first …
Gate engineered heterostructure junctionless TFET with Gaussian doping profile for ambipolar suppression and electrical performance improvement
H Aghandeh, SAS Ziabari - Superlattices and Microstructures, 2017 - Elsevier
This study investigates a junctionless tunnel field-effect transistor with a dual material gate
and a heterostructure channel/source interface (DMG-H-JLTFET). We find that using the …
and a heterostructure channel/source interface (DMG-H-JLTFET). We find that using the …