Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …

Extreme ultraviolet lithography (EUVL) has been demonstrated to meet the industrial
requirements of new-generation semiconductor fabrication. The development of high-power …

We report the demonstration of a diode-pumped Tm: YLF laser operating at 1.88 µm that
produces pulse energies up to 3.88 J in 20 ns. The compact system consists of a Q-switched …

We studied Extreme Ultra-Violet (EUV) emission characteristics of the 13.5 nm wavelength
from CO_2 laser-irradiated pre-formed tin plasmas using 2D radiation hydrodynamic …

We present the results of a joint experimental and theoretical study of plasma expansion
arising from Nd: YAG laser ablation (laser wavelength λ= 1.064 μm) of tin microdroplets in …

Plasma dynamics are governed by electron density (ne), electron temperature (T e), and
radiative energy transfer as well as by macroscopic flows. However, plasma flow-velocity …

The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin
targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …

Nano-fabrication techniques have demonstrated their vital importance in technological
innovation. However, low-throughput, high-cost and intrinsic resolution limits pose …

We characterize the properties of extreme ultraviolet (EUV) light source plasmas driven by
laser wavelengths in the λ laser= 1.064− 10.6 μ m range and laser intensities of I laser= 0.5 …

Experimental spectroscopic studies are presented, in a 5.5–25.5 nm extreme-ultraviolet
(EUV) wavelength range, of the light emitted from plasma produced by the irradiation of tin …