Thin film reaction of transition metals with germanium
S Gaudet, C Detavernier, AJ Kellock… - Journal of Vacuum …, 2006 - pubs.aip.org
A systematic study of the thermally induced reaction of 20 transition metals (Ti, Zr, Hf, V, Nb,
Ta, Cr, Mo, W, Mn, Re, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, and Cu) with Ge substrates was carried …
Ta, Cr, Mo, W, Mn, Re, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, and Cu) with Ge substrates was carried …
Texture in thin film silicides and germanides: A review
B De Schutter, K De Keyser, C Lavoie… - Applied Physics …, 2016 - pubs.aip.org
Silicides and germanides are compounds consisting of a metal and silicon or germanium. In
the microelectronics industry, silicides are the material of choice for contacting silicon based …
the microelectronics industry, silicides are the material of choice for contacting silicon based …
Reaction of thin Ni films with Ge: Phase formation and texture
S Gaudet, C Detavernier, C Lavoie… - Journal of Applied …, 2006 - pubs.aip.org
The solid-state reaction between a 30-nm-thick Ni film and Ge substrates was investigated
using in situ x-ray diffraction, diffuse light scattering, and four-point probe electrical …
using in situ x-ray diffraction, diffuse light scattering, and four-point probe electrical …
Ferromagnetism and Nonmetallic Transport of Thin-Film : A Stabilized Metastable Material
A metastable phase α-FeSi 2 was epitaxially stabilized on a silicon substrate using pulsed
laser deposition. Nonmetallic and ferromagnetic behaviors are tailored on α-FeSi 2 (111) …
laser deposition. Nonmetallic and ferromagnetic behaviors are tailored on α-FeSi 2 (111) …
Prediction of orientation relationships and interface structures between α-, β-, γ-FeSi2 and Si phases
MA Visotin, IA Tarasov, AS Fedorov… - … Section B: Structural …, 2020 - journals.iucr.org
A pure crystallogeometrical approach is proposed for predicting orientation relationships,
habit planes and atomic structures of the interfaces between phases, which is applicable to …
habit planes and atomic structures of the interfaces between phases, which is applicable to …
Self-consistent mapping: Effect of local environment on formation of magnetic moment in
The Hohenberg-Kohn theorem establishes a basis for mapping the exact energy functional
to a model one provided that their charge densities coincide. We suggest to use a mapping …
to a model one provided that their charge densities coincide. We suggest to use a mapping …
Structural features and surface composition of epitaxial α-FeSi2 films obtained by CVD
RV Pushkarev, NI Fainer, H Katsui, VV Kaichev… - Materials & Design, 2018 - Elsevier
Abstract Iron disilicide (α-FeSi 2) is one of the promising materials for building ohmic
contacts over silicon substrates. Complex approaches have been used to synthesize this …
contacts over silicon substrates. Complex approaches have been used to synthesize this …
Electron microscope verification of prebreakdown-inducing α-FeSi2 needles in multicrystalline silicon solar cells
A Hähnel, J Bauer, H Blumtritt, O Breitenstein… - Journal of Applied …, 2013 - pubs.aip.org
It had been shown already earlier by X-ray microanalysis that, in positions of defect-induced
junction breakdown in industrial multicrystalline (mc) silicon solar cells, iron-containing …
junction breakdown in industrial multicrystalline (mc) silicon solar cells, iron-containing …
Substrate orientation effects on the nucleation and growth of the Mn+ 1AXn phase Ti2AlC
MD Tucker, POÅ Persson, MC Guenette… - Journal of Applied …, 2011 - pubs.aip.org
The M n+ 1 AX n (MAX) phases are ternary compounds comprising alternating layers of a
transition metal carbide or nitride and a third “A-group” element. The effect of substrate …
transition metal carbide or nitride and a third “A-group” element. The effect of substrate …
Texture of NiSi films on Si (001),(111), and (110) substrates
C Detavernier, J Jordan-Sweet, C Lavoie - Journal of Applied Physics, 2008 - pubs.aip.org
Synchrotron radiation was used to study the texture of poly-crystalline NiSi films that were
formed by a solid state reaction between a 30 nm Ni film and Si (001),(111), and (110) …
formed by a solid state reaction between a 30 nm Ni film and Si (001),(111), and (110) …