An isotropic etching, etch rate and surface roughness of Si, Ge and Si 0.8 Ge 0.2 subjected
to CF 4/Ar/O 2 plasma has been studied using inductively coupled plasma (ICP) system …

This paper reports a novel method for fabrication of diaphragm along with microtunnels for
various applications. Micromasking, grass formation, uniformity over the process wafer …

Targeted therapy using magnetic microparticles and nanoparticles has the potential to
mitigate the negative side-effects associated with conventional medical treatment. Major …

The selective etching characteristics of silicon, germanium, and Si0. 5Ge0. 5 subjected to a
downstream H2/CF4/Ar plasma have been studied using a pair of in situ quartz crystal …

Manganese dioxide (MnO 2) particles were incorporated into the traditional wet acid etching
(HF/HNO 3/H 2 O) system to improve the texturization performance of multicrystalline silicon …

A novel mediator-free, non-enzymatic electrochemical sensor, based on a graphene-
Schottky junction, was fabricated for glucose detection. The sensor offers a promising …

We present a key idea of using the graphene-based Schottky junction to achieve high
sensitivity and wide detection range radiation sensors. Nanostructured Schottky junction is …

Presently, no resist material has suitable properties to satisfy simultaneously all
requirements on lateral resolution and plasma etching resistance for pattern transfer of high …

The fabrication of high aspect ratio (AR) Si structure with extremely small feature size is
attracting more and more attention recently. In this work, a top-down scheme for fabricating …

A method of etching a substrate includes generating plasma comprising a first concentration
of an etchant and a second concentration of an inhibitor and etching the substrate by …