Nanoionic memristive phenomena in metal oxides: the valence change mechanism
This review addresses resistive switching devices operating according to the bipolar
valence change mechanism (VCM), which has become a major trend in electronic materials …
valence change mechanism (VCM), which has become a major trend in electronic materials …
On the switching parameter variation of metal-oxide RRAM—Part I: Physical modeling and simulation methodology
The variation of switching parameters is one of the major challenges to both the scaling and
volume production of metal-oxide-based resistive random-access memories (RRAMs). In …
volume production of metal-oxide-based resistive random-access memories (RRAMs). In …
Microscopic Modeling of HfOx RRAM Operations: From Forming to Switching
A Padovani, L Larcher, O Pirrotta… - … on electron devices, 2015 - ieeexplore.ieee.org
We propose a model describing the operations of hafnium oxide-based resistive random
access memory (RRAM) devices at the microscopic level. Charge carrier and ion transport …
access memory (RRAM) devices at the microscopic level. Charge carrier and ion transport …
Resistive switching in HfO2 based valence change memories, a comprehensive 3D kinetic Monte Carlo approach
S Aldana, P García-Fernández… - Journal of Physics D …, 2020 - iopscience.iop.org
A simulation study has been performed to analyze resistive switching (RS) phenomena in
valence change memories (VCM) based on a HfO 2 dielectric. The kernel of the simulation …
valence change memories (VCM) based on a HfO 2 dielectric. The kernel of the simulation …
Robust compact model for bipolar oxide-based resistive switching memories
Emerging nonvolatile memories based on resistive switching mechanisms pull intense
research and development efforts from both academia and industry. Oxide-based resistive …
research and development efforts from both academia and industry. Oxide-based resistive …
Kinetic Monte Carlo analysis of data retention in Al: HfO2-based resistive random access memories
S Aldana, E Pérez, F Jiménez-Molinos… - Semiconductor …, 2020 - iopscience.iop.org
Abstract Kinetic Monte Carlo resistive random access memory simulations are used to
understand different retention experiments performed at several temperatures. The physics …
understand different retention experiments performed at several temperatures. The physics …
Controlling uniformity of RRAM characteristics through the forming process
A Kalantarian, G Bersuker, DC Gilmer… - 2012 IEEE …, 2012 - ieeexplore.ieee.org
The proposed constant voltage forming (CVF) is shown to increase the resistances of the
low resistance and high resistance states while reducing their variability. By forcing the …
low resistance and high resistance states while reducing their variability. By forcing the …
Bipolar Resistive RAM Based on : Physics, Compact Modeling, and Variability Control
FM Puglisi, L Larcher, A Padovani… - IEEE Journal on …, 2016 - ieeexplore.ieee.org
In this paper, we thoroughly investigate the characteristics of the TiN/Ti/HfO 2/TiN resistive
random access memory (RRAM) device. The physical mechanisms involved in the device …
random access memory (RRAM) device. The physical mechanisms involved in the device …
[HTML][HTML] Memristor compact model with oxygen vacancy concentrations as state variables
We present a unique compact model for oxide memristors based upon the concentration of
oxygen vacancies as state variables. In this model, the increase (decrease) in oxygen …
oxygen vacancies as state variables. In this model, the increase (decrease) in oxygen …
Microscopic understanding and modeling of HfO2 RRAM device physics
L Larcher, A Padovani, O Pirrotta… - 2012 International …, 2012 - ieeexplore.ieee.org
In this paper we investigate the physical mechanisms governing operations in HfO x RRAM
devices. Forming set and reset processes are studied using a model including power …
devices. Forming set and reset processes are studied using a model including power …