Surface electron‐diffraction patterns of β‐FeSi2 films epitaxially grown on silicon

JE Mahan, VL Thanh, J Chevrier, I Berbezier… - Journal of applied …, 1993 - pubs.aip.org
Semiconducting &FeSi, is drawing much current research interest because of hoped-for
silicon-based optoelectronics applications. The study of heteroepitaxial fdm growth on …

Electron-spin-resonance STM on iron atoms in silicon

Y Manassen, I Mukhopadhyay, NR Rao - Physical Review B, 2000 - APS
Electron-spin-resonance–scanning tunneling microscopy (ESR)-(STM) of iron atoms in
silicon was observed: Si (111) surfaces were covered with iron atoms and annealed. This …

Silicide epilayers: recent developments and prospects for a Si-compatible technology

J Derrien, J Chevrier, V Le Thanh, TE Crumbaker… - Applied surface …, 1993 - Elsevier
Semiconducting silicides epitaxially grown on silicon may be promising materials for
integrated optoelectronic devices. The structure and the physical properties of FeSi 2 are …

Thermal reaction of iron with a Si (111) vicinal surface: Surface ordering and growth of CsCl-type iron silicide

A Wawro, S Suto, R Czajka, A Kasuya - Physical Review B, 2003 - APS
The structural evolution of a vicinal silicon surface, developing upon low coverage
deposition of Fe [0.33 and 2 monolayers (ML)], has been carefully studied as a function of …

Scanning tunneling microscopy and spectroscopy of iron suicide epitaxially grown on Si (111)

W Raunau, H Niehus, T Schilling, G Comsa - Surface science, 1993 - Elsevier
Epitaxial iron suicide films have been grown on Si (111) by solid phase epitaxy (SPE) in
UHV. Structural and electronic properties have been investigated with scanning tunneling …

Epitaxial iron silicides on Si (001): an investigation with scanning tunneling microscopy and spectroscopy

W Raunau, H Niehus, G Comsa - Surface science, 1993 - Elsevier
Iron silicide films have been grown epitaxially on Si (001) by solid phase epitaxy (SPE) in
UHV. The grown silicide films have been investigated in geometric and electronic structure …

Epitaxial phase transitions in the iron/silicon system

H Von Känel, N Onda, H Sirringhaus… - Applied Surface …, 1993 - Elsevier
The properties of a newly discovered pseudomorphic FeSi/Si (111) phase with the CsCl
structure are discussed. Upon annealing the new phase undergoes phase transitions to the …

Atomic structure of the reactive Fe/Si (111) 7× 7 interface

A Mascaraque, J Avila, C Teodorescu, MC Asensio… - Physical Review B, 1997 - APS
The early stages of Fe/Si (111) interface formation have been investigated using x-ray
photoelectron diffraction. Deposition of Fe in the range of one monolayer on Si (111) 7× 7 at …

Homogeneous surface iron silicide formation on Si(111): The phase

M Krause, F Blobner, L Hammer, K Heinz, U Starke - Physical Review B, 2003 - APS
The early stages of iron silicide formation on Si (111) were studied by scanning tunneling
microscopy (STM), low-energy electron diffraction, and Auger electron spectroscopy. While …

Iron silicides grown on Si (100): metastable and stable phases

J Chrost, JJ Hinarejos, P Segovia, EG Michel… - Surface science, 1997 - Elsevier
The growth of iron silicides on Si (100) by solid phase epitaxy has been investigated by
photoelectron spectroscopies. The different iron silicide phases appearing and their stability …