Bias temperature instability of mosfets: Physical processes, models, and prediction

JF Zhang, R Gao, M Duan, Z Ji, W Zhang, J Marsland - Electronics, 2022 - mdpi.com
CMOS technology dominates the semiconductor industry, and the reliability of MOSFETs is a
key issue. To optimize chip design, trade-offs between reliability, speed, power …

As-grown-generation (AG) model of NBTI: A shift from fitting test data to prediction

JF Zhang, Z Ji, W Zhang - Microelectronics Reliability, 2018 - Elsevier
Negative bias temperature instabilities (NBTI) received little attention pre-2000, but have
been intensively investigated post-2000, as they become limiting device lifetime. The …

In situ electron holography study of charge distribution in high-κ charge-trapping memory

Y Yao, C Li, ZL Huo, M Liu, CX Zhu, CZ Gu… - Nature …, 2013 - nature.com
Charge-trapping memory with high-κ insulator films is a candidate for future memory
devices. Many efforts with different indirect methods have been made to confirm the trapping …

Energy distribution of positive charges in gate dielectric: Probing technique and impacts of different defects

SWM Hatta, Z Ji, JF Zhang, M Duan… - … on Electron Devices, 2013 - ieeexplore.ieee.org
Positive charges (PCs) in gate dielectric shift the threshold voltage and cause a time-
dependent device variability. To assess their impact on circuits, it is useful to know their …

NBTI lifetime prediction and kinetics at operation bias based on ultrafast pulse measurement

Z Ji, L Lin, JF Zhang, B Kaczer… - IEEE Transactions on …, 2009 - ieeexplore.ieee.org
Predicting negative bias temperature instability (NBTI) lifetime can be dangerous since it is
difficult to assess its safety margin. The common technique uses gate bias V g acceleration …

An analysis of the NBTI-induced threshold voltage shift evaluated by different techniques

Z Ji, JF Zhang, MH Chang, B Kaczer… - … on Electron Devices, 2009 - ieeexplore.ieee.org
Negative bias temperature instability (NBTI) is limiting the lifetime of pMOSFETs, and it is
often monitored by the shift of threshold voltage DeltaV t. Different techniques have been …

Negative bias temperature instability lifetime prediction: Problems and solutions

Z Ji, S Hatta, JF Zhang, JG Ma, W Zhang… - 2013 IEEE …, 2013 - ieeexplore.ieee.org
Lifetime of pMOSFETs is limited by NBTI. Conventional slow measurement overestimates
lifetime due to recovery. The fast techniques suppress recovery, but cannot give reliable …

Effect of high-k passivation layer on high voltage properties of GaN metal-insulator-semiconductor devices

Y Cai, Y Wang, Y Liang, Y Zhang, W Liu, H Wen… - IEEE …, 2020 - ieeexplore.ieee.org
In this paper, the GaN-based MIS-HEMTs with Si 3 N 4 single-layer passivation, Al 2 O 3/SiN
x bilayer passivation, and ZrO 2/SiN x bilayer passivation are demonstrated. High-k …

Defects and instabilities in Hf-dielectric/SiON stacks

JF Zhang - Microelectronic engineering, 2009 - Elsevier
In this work, a review on the recent progress in understanding defects and instabilities in Hf-
dielectric/SiON stacks will be given for both nMOSFETs and pMOSFETs. The key issues …

Defect loss: A new concept for reliability of MOSFETs

M Duan, JF Zhang, Z Ji, W Zhang… - IEEE electron device …, 2012 - ieeexplore.ieee.org
Defect generation limits device lifetime and enhances its variability. Previous works mainly
addressed the generation kinetics and process. The current understanding is that the …