Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2

Y Lee, S Kim, J Lee, C Cho, I Seong, S You - Sensors, 2022 - mdpi.com
As low-temperature plasma plays an important role in semiconductor manufacturing, plasma
diagnostics have been widely employed to understand changes in plasma according to …

Measurement of electron density and electron temperature of a cascaded arc plasma using laser Thomson scattering compared to an optical emission spectroscopic …

W Yong, LI Cong, SHI Jielin, WU Xingwei… - Plasma Science and …, 2017 - iopscience.iop.org
As advanced linear plasma sources, cascaded arc plasma devices have been used to
generate steady plasma with high electron density, high particle flux and low electron …

Characteristics of a kHz helium atmospheric pressure plasma jet interacting with two kinds of targets

XU Guimin, G Yue, LI Xinzhe… - Plasma Science and …, 2021 - iopscience.iop.org
This study investigates the influence of two types of target, skin tissue and cell culture
medium, with different permittivities on a kHz helium atmospheric pressure plasma jet …

[引用][C] 大气压氩气等离子体射流在不同作用状态下的光电特性

许桂敏, 张冠军, 姚聪伟, 石兴民, 段晨东 - 高电压技术, 2019