Porous polymeric membranes have shown great potential in biological and biomedical
applications such as tissue engineering, bioseparation, and biosensing, due to their …

Directed self-assembly (DSA) of the domain structure in block copolymer (BCP) thin films is
a promising approach for sub-10-nm surface patterning. DSA requires the control of …

Top coat design, coating, and optimization methodologies are introduced that facilitate the
synthesis, application, and identification of neutral top coats for block copolymer (BP) thin …

Directed self-assembly (DSA) of block copolymers (BCPs) is an attractive advanced
patterning technology being considered for future integrated circuit manufacturing. By …

Self‐standing isoporous membranes based on amphiphilic block copolymers (BCPs) are an
outstanding candidate for efficient separation processes. Such fascinating membranes have …

The membrane formation directly through the self-assembly and nonsolvent induced phase
separation (SNIPS) method without the aid of foreign additives has been more challenging …

Access to well-defined materials is one of the key requirements for successful
implementation of block copolymer-based lithography for advanced semiconductor nodes …

Self-assembly and non-solvent induced phase separation (SNIPS) was extensively used in
the fabrication of isoporous membranes for its compatibility with massive production …

Directed Self-Assembly (DSA) of block copolymers is a candidate advanced patterning
technology at future technology nodes. Although DSA promises resolution and cost benefits …

Block copolymers (BCPs) are utilized by the microelectronics industry for their ability to
phase separate at very small length scales (< 20 nm). By casting these BCPs as a thin film …