This new edition of the bestselling Microlithography: Science and Technology provides a
balanced treatment of theoretical and operational considerations, from elementary concepts …

Photolithography is the most widely used mass nanoproduction process. Technology
requirements demand smaller nanodevices. However, smaller features risk collapse during …

Carbonyl sulfide (COS) was added to oxygen as the additive etch gas for etching of
amorphous carbon layers (ACL), and its effect on the etching characteristics of ACLs as the …

In this study, a comprehensive approach towards assessing pattern collapse challenges and
solutions for Extreme Ultraviolet Lithography (EUV) resists beyond the 14nm node is …

In the current and next-generation Si-based semiconductor manufacturing processes,
amorphous carbon layer (ACL) hard masks are garnering considerable attention for high …

In this study we determined the dimension dependent onset of pattern collapse for different
193 and 157nm resist platforms, and explored production relevant techniques to suppress …

The aim of this paper is to demonstrate a new approach for improving high resolution
lithography by using an amorphous carbon hard mask with an oxide capping layer. A full 3D …

The importance of hardmask technology is becoming increasingly evident as the demand for
high-resolution imaging dictates the use of ever-thinner resist films. An appropriately …

Several CO2-soluble surfactants with different molecular architectures were investigated as
possible agents to remove rinse water from aqueous-based photoresists utilizing …

抄録 We designed and synthesized a new partially-protected polyphenol, 25X-MBSA-M, for
which the position and number of protected hydroxyl groups have no dispersion, and …