High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized
physical vapor deposition technique and is already making its way to industrial applications …

Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

The physical and chemical aspects of plasma–surface interaction in high-power impulse
magnetron sputtering (HiPIMS) discharges are overviewed. The data obtained by various …

The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …

The influence on thin film density using high power impulse magnetron sputtering (HiPIMS)
has been investigated for eight different target materials (Al, Ti, Cr, Cu, Zr, Ag, Ta, and Pt) …

Plasma-based physical vapor deposition (PVD) methods have found widespread use in
various industrial applications. In plasma-based PVD processes, the deposition species are …

Tungsten thin films have exceptional thermal and mechanical properties, compared to other
pure metal coatings, making them indispensable in many contemporary high-tech …

A time-dependent plasma discharge model has been developed for the ionization region in
a high-power impulse magnetron sputtering (HiPIMS) discharge. It provides a flexible …

Time-resolved tunable diode-laser absorption spectroscopy measurements were performed
on the argon metastable (Ar m) level 3s 2 3p 5$(^{2}{\rm P}^{\circ} _ {3/2}) $ 4s excited at …

This study presents the physical, mechanical properties and dry turning performance of
AlTiN, AlTiCrN, and TiN/TiAlN coatings produced on K-grade tungsten carbide insert by …