Inverse lithography technology: 30 years from concept to practical, full-chip reality
L Pang - Journal of Micro/Nanopatterning, Materials, and …, 2021 - spiedigitallibrary.org
In lithography, optical proximity and process bias/effects need to be corrected to achieve the
best wafer print. Efforts to correct for these effects started with a simple bias, adding a …
best wafer print. Efforts to correct for these effects started with a simple bias, adding a …
AI/ML algorithms and applications in VLSI design and technology
An evident challenge ahead for the integrated circuit (IC) industry is the investigation and
development of methods to reduce the design complexity ensuing from growing process …
development of methods to reduce the design complexity ensuing from growing process …
A case study of deep reinforcement learning for engineering design: Application to microfluidic devices for flow sculpting
Efficient exploration of design spaces is highly sought after in engineering applications. A
spectrum of tools has been proposed to deal with the computational difficulties associated …
spectrum of tools has been proposed to deal with the computational difficulties associated …
Advances in inverse lithography
T Cecil, D Peng, D Abrams, SJ Osher… - ACS …, 2022 - ACS Publications
As Moore's law has marched forward, progressively shrinking chip designs at a consistent
pace, the manufacturing of those chips has raced to keep up. Through advances in …
pace, the manufacturing of those chips has raced to keep up. Through advances in …
MOSAIC: Mask optimizing solution with process window aware inverse correction
Optical Proximity Correction (OPC) has been widely adopted for resolution enhancement to
achieve nanolithography. However, conventional rule-based and model-based OPCs …
achieve nanolithography. However, conventional rule-based and model-based OPCs …
Neural network analysis of quasistationary magnetic fields in microcoils driven by short laser pulses
IV Kochetkov, ND Bukharskii, M Ehret, Y Abe… - Scientific Reports, 2022 - nature.com
Optical generation of kilo-tesla scale magnetic fields enables prospective technologies and
fundamental studies with unprecedentedly high magnetic field energy density. A question is …
fundamental studies with unprecedentedly high magnetic field energy density. A question is …
Data efficient lithography modeling with transfer learning and active data selection
Lithography simulation is one of the key steps in physical verification, enabled by the
substantial optical and resist models. A resist model bridges the aerial image simulation to …
substantial optical and resist models. A resist model bridges the aerial image simulation to …
Pixelated source mask optimization for process robustness in optical lithography
N Jia, EY Lam - Optics express, 2011 - opg.optica.org
Optical lithography has enabled the printing of progressively smaller circuit patterns over the
years. However, as the feature size shrinks, the lithographic process variation becomes …
years. However, as the feature size shrinks, the lithographic process variation becomes …
Optical proximity correction with hierarchical bayes model
Optical Proximity Correction (OPC) is one of the most important techniques in today's optical
lithography based manufacturing process. Although the most widely used model-based …
lithography based manufacturing process. Although the most widely used model-based …
Optical proximity correction using a multilayer perceptron neural network
R Luo - Journal of Optics, 2013 - iopscience.iop.org
Optical proximity correction (OPC) is one of the resolution enhancement techniques (RETs)
in optical lithography, where the mask pattern is modified to improve the output pattern …
in optical lithography, where the mask pattern is modified to improve the output pattern …