Coatings with micro-or nano-scaled structure are always fabricated by various techniques to
fulfill the requirements of unique performances according to special working conditions. The …

In plasma-based deposition processing, the importance of low-energy ion bombardment
during thin film growth can hardly be exaggerated. Ion bombardment is an important …

The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …

Titanium carbide (TiC) coatings are widely used in several industrial applications, including
tooling and tribological applications. These materials are used due to their mechanical …

The plasma over a magnetron's erosion “racetrack” is not azimuthally uniform but
concentrated in distinct dense ionization zones which move in the E× B direction with about …

The physical and chemical aspects of plasma–surface interaction in high-power impulse
magnetron sputtering (HiPIMS) discharges are overviewed. The data obtained by various …

High power pulsed magnetron sputtering (HPPMS) is used to deposit CrN films without
external heating at different peak target currents, while the average current is kept constant …

Ta thin films were grown on Si substrates at different inclination angles with respect to the
sputter source using high power impulse magnetron sputtering (HIPIMS), an ionized …

Direct current magnetron sputtering (dcMS) is a widely used technique for deposition of a
large number of compound and metallic coatings with specified mechanical, electrical and …

TiC x thin films have been deposited on steel substrates using High Power Impulse
Magnetron Sputtering (HiPIMS) under Ar-C 2 H 2 atmosphere. The effect of varying the …