A photolithography method includes producing, from an optical source, a pulsed light beam;
and scanning the pulsed light beam across a substrate of a lithography exposure apparatus …

A spectral feature of a pulsed light beam produced by an optical source is controlled by a
method. The method includes producing a pulsed light beam at a pulse repetition rate; …

There is set forth herein in one embodiment, a structure including a metallic grating having a
grating pattern, the metallic grating including a critical dimension. The metallic grating can …

Articles having improved flame retardance and chemical resistance properties can be made
from blends containing a cross-linkable polycarbonate resin having repeating units derived …

Polymeric compositions having improved flame retardance properties are disclosed. The
compositions comprise a cross-linkable polycarbonate resin having a photoactive group …

Polymeric compositions having improved flame retardance properties are disclosed. The
compositions comprise a cross-linkable polycarbonate resin having a photoactive group …

A spectral feature of a pulsed light beam produced by an optical source is adjusted by
receiving an instruction to change a spectral feature of the pulsed light beam from a value in …

A method includes producing a pulsed light beam; directing the pulsed light beam toward a
substrate mounted to a stage of a lithography exposure apparatus; scanning a pulsed light …

A photolithography method includes instructing an optical source to produce a pulsed light
beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus …

A lithography system includes an optical source configured to emit a pulsed light beam; a
lithography apparatus including an optical system, the optical system being positioned to …