Bipolar transistor with lattice matched base layer

RE Welser, PM Deluca, N Pan - US Patent 7,186,624, 2007 - Google Patents
(57) ABSTRACT A semiconductor material which has a high carbon dopant concentration
and is composed of gallium, indium, arsenic and nitrogen is disclosed. The material is useful …

Bipolar transistor with enhanced base transport

EM Rehder, RE Welser, CR Lutz - US Patent 7,566,948, 2009 - Google Patents
A bipolar transistor includes a base layer design and a method for fabricating such a bipolar
transistor that employ a built-in accelerating field focused on a base region adjacent to a …

Turn-on voltage investigation of GaAs-based bipolar transistors with Ga/sub 1-x/In/sub x/As/sub 1-y/Ny base layers

RE Welser, PM DeLuca, N Pan - IEEE Electron Device Letters, 2000 - ieeexplore.ieee.org
The fundamental lower limit on the turn on voltage of GaAs-based bipolar transistors is first
established, then reduced with the use of a novel low energy-gap base material, Ga/sub 1 …

GaInP/GaAs collector-up tunneling-collector heterojunction bipolar transistors (C-up TC-HBTs): Optimization of fabrication process and epitaxial layer structure for high …

K Mochizuki, RJ Welty, PM Asbeck… - … on Electron Devices, 2000 - ieeexplore.ieee.org
This paper describes a novel heterojunction bipolar transistor (HBT) structure, the collector-
up tunneling-collector HBT (C-up TC-HBT), that minimizes the offset voltage V/sub CE …

Bipolar transistor

RE Welser, PM Deluca, CR Lutz, KS Stevens… - US Patent …, 2008 - Google Patents
Related US Application Data Reynolds, PC (63) Continuation-in-part of application No.
10/121.444,(57) ABSTRACT filed on Apr. 10, 2002, now Pat. No. 6,847,060, which is a …

Bipolar transistor with graded base layer

RE Welser, PM Deluca, CR Lutz, KS Stevens - US Patent 6,847,060, 2005 - Google Patents
(57) ABSTRACT A Semiconductor material which has a high carbon dopant concentration
includes gallium, indium, arsenic and nitro gen. The disclosed Semiconductor materials …

[PDF][PDF] High Performance Al0: 35 Ga0: 65 As/GaAs HBT's

RE Welser, N Pan, CR Lutz, DP Vu… - IEEE Electron Device …, 2000 - academia.edu
(HBT's) are demonstrated to have excellent dc and RF properties comparable to
InGaP/GaAs HBT's by increasing the Al composition. Al0 35Ga0 65As/GaAs HBT's exhibit …

Characterization of InGaP/GaAs heterojunction bipolar transistors with a heavily doped base

T Oka, K Ouchi, K Mochizuki - Japanese Journal of Applied …, 2001 - iopscience.iop.org
Abstract Characteristics of InGaP/GaAs heterojunction bipolar transistors (HBTs) with a
heavily doped base are examined at the base doping level NB ranging from 5× 10 19 to 5× …

Neutral base recombination in InP∕ GaAsSb∕ InP double-heterostructure bipolar transistors: Suppression of Auger recombination in p+ GaAsSb base layers

CR Bolognesi, HG Liu, N Tao, X Zhang… - Applied Physics …, 2005 - pubs.aip.org
We report on the tradeoff between current gain β and the base sheet resistance R SH in
metalorganic chemical vapor deposition-grown NpN InP∕ GaAs 1− x Sb x∕ InP double …

Minority carrier properties of carbon-doped GaInAsN bipolar transistors

RE Welser, RS Setzko, KS Stevens… - Journal of Physics …, 2004 - iopscience.iop.org
We have developed an InGaP/GaInAsN/GaAs double heterojunction bipolar transistor
technology that substantially improves upon existing GaAs-based HBTs. Band-gap …