Recent Developments in Understanding the Gate Switching Instability in Silicon Carbide MOSFETs

MW Feil, K Waschneck, H Reisinger… - 2023 IEEE …, 2023 - ieeexplore.ieee.org
Silicon carbide (SiC) metal-oxide-semiconductor field-effect transistors (MOSFETs) are
becoming increasingly important in numerous renewable energy applications that inherently …

Gate switching instability in silicon carbide MOSFETs—Part I: Experimental

MW Feil, K Waschneck, H Reisinger… - … on Electron Devices, 2024 - ieeexplore.ieee.org
In the context of renewable energy generation, compact and efficient electric power
conversion is becoming increasingly important. Due to their low-loss switching capability at …

Assessing, controlling and understanding parameter variations of SiC power MOSFETs in switching operation

T Aichinger, MW Feil, P Salmen - Key Engineering Materials, 2023 - Trans Tech Publ
Semiconductor manufacturers and researchers have recently revealed that under specific
bipolar gate switching conditions SiC MOSFETs exhibit parameter drift dynamics different …

Temperature-dependent electroluminescence of a gate pulsed silicon carbide metal–oxide–semiconductor field-effect transistor: Insight into interface traps

M Weger, MW Feil, M Van Orden, J Cottom… - Journal of Applied …, 2023 - pubs.aip.org
Switching a silicon carbide (SiC) metal–oxide–semiconductor field-effect transistor between
inversion and accumulation with removed drain and grounded source terminals leads to …

Electroluminescence Spectra of a Gate Switched MOSFET at Cryogenic and Room Temperatures Agree with Ab Initio Calculations of 4H-SiC/SiO2-Interface Defects

M Weger, D Biermeier, MW Feil, J Cottom… - Materials Science …, 2023 - Trans Tech Publ
To reach the theoretical performance limit of 4HSiCMOSFETs the SiC/SiO2interfacedefects
along the inversion channel need to be fully identified in order to be avoided. We employa …

Time-gated optical spectroscopy of field-effect-stimulated recombination via interfacial point defects in fully processed silicon carbide power MOSFETs

MW Feil, M Weger, H Reisinger, T Aichinger… - Physical Review …, 2024 - APS
Fully processed SiC power MOSFETs emit light during switching of the gate terminal, while
the drain and source terminals are both grounded. The emitted photons are caused by …

Exploring the border traps near the SiO2-SiC interface using conductance measurements

P Kumar, M Krummenacher… - 2024 IEEE …, 2024 - ieeexplore.ieee.org
The high density of interface and border traps is responsible for the reduced mobility and
threshold voltage instabilities in state-of-the-art SiC power devices. In this work, we have …

[HTML][HTML] Photon-assisted electron depopulation of 4H-SiC/SiO2 interface states in n-channel 4H-SiC metal–oxide–semiconductor field effect transistors

M Weger, J Kuegler, M Nelhiebel, M Moser… - Journal of Applied …, 2024 - pubs.aip.org
4H-SiC/SiO 2 interface states play a major role in the performance and reliability of modern
4H-SiC metal–oxide–semiconductor field effect transistors (MOSFETs). To gain new insights …

Emission of Trapped Electrons from the 4H-SiC/SiO2-Interface via Photon-Irradiance at Cryogenic Temperatures

M Weger, M Bockstedte, G Pobegen - Defect and Diffusion Forum, 2024 - Trans Tech Publ
For a reliable MOSFET performance it is crucial to identify and reduce device performance
limiting 4H-SiC/SiO2 interface defects. Previous studies have focused on the quantification …

[PDF][PDF] The Editorial Board and Editorial Team are delighted to present a selection of short Research Highlights describing some of our favourite Communications …

M Feil - scienceopen.com
As 2023 draws to a close, we highlight some of the great stories of engineering insight and
solutions that we have published over the year. The final selection covers topics from across …