(57) ABSTRACT A system and method for detecting the potential of non cathode arcing in a
plasma generation apparatus, such as a physical vapor deposition chamber. The system …

An enhanced reactive plasma processing method and system useful for deposition of highly
insulating films. A variety of alternative embodiments are allowed for varying applications. In …

Slow filter 104 power generator to a load. A Subsequently measured value of the parameter
that exceeds the computed dynamic boundary of the parameter indicates detection of an arc …

This invention relates to the deposition of thin films and is more concerned with a reactive
sputtering process wherein atoms of a target material are freed from a conduc tive target and …

(57) ABSTRACT A system and method for managing power delivered to a processing
chamber is described. In one embodiment current is drawn away from the plasma …

Current controlled power Sources are disclosed that are capable of generating currents in
low resistance, high tem perature plasmas that are regulated to prevent the generation of …

2. Background Art Referring to FIG. 1A, a plasma chamber 10 operating at a high RF
frequency (eg, 13.56 MHz) holds a semicon ductor wafer or substrate (not shown) and …

Exemplary embodiments of the present invention that are shown in the drawings are
Summarized below. These and other embodiments are more fully described in the Detailed …

There is provided by this invention novel magnetron Sput tering apparatus that is generally
comprised of a pulsed dc power Supply capable of delivering peak powers of 0.1 …

A method and apparatus for detecting arcs in a plasma processing system is disclosed. In
one embodiment the apparatus comprises an input to receive a measured value of a …