Review of CVD TiN coatings for wear-resistant applications: deposition processes, properties and performance
HE Rebenne, DG Bhat - Surface and coatings technology, 1994 - Elsevier
Titanium nitride (TiN) deposited by chemical vapor deposition (CVD) techniques has been
the premier wear-resistant coating in many applications for the last several decades. This …
the premier wear-resistant coating in many applications for the last several decades. This …
Microstructure of model cermets with high Mo or W content
P Lindahl, P Gustafson, U Rolander, L Stals… - International Journal of …, 1999 - Elsevier
The microstructure of (mol%) TiC–18TiN–24Ni–(10–29) WC and TiC–18TiN–24Ni–(5–14)
Mo2C has been investigated using X-ray diffraction (XRD), optical microscopy (OM) …
Mo2C has been investigated using X-ray diffraction (XRD), optical microscopy (OM) …
Development of a graded TiCN coating for cemented carbide cutting tools—a design approach
K Narasimhan, SP Boppana, DG Bhat - Wear, 1995 - Elsevier
Cemented carbide cutting tools containing a high percentage of cobalt binder (9–13%) are
used for rough machining applications involving interruptions, owing to their high fracture …
used for rough machining applications involving interruptions, owing to their high fracture …
[图书][B] Kinetic and microstructural study of titanium nitride deposited by laser chemical vapor deposition
KM Egland - 1997 - search.proquest.com
Titanium nitride (TiN) films were deposited onto Ti-6Al-4V substrates by laser chemical
vapor deposition using a cw CO $\sb2 $ laser and $\rm TiCl\sb4,\N\sb2, $ and H $\sb2 …
vapor deposition using a cw CO $\sb2 $ laser and $\rm TiCl\sb4,\N\sb2, $ and H $\sb2 …
[图书][B] An investigation of the temperature distribution induced during laser chemical vapor deposition (LCVD) of titanium nitride on titanium-aluminum-vanadium
MN Azer - 1996 - search.proquest.com
To understand how the substrate temperature influences the deposition rate and spatial
profile of deposits formed using laser chemical vapor deposition (LCVD), spatially resolved …
profile of deposits formed using laser chemical vapor deposition (LCVD), spatially resolved …
Preparation, morphology, and electrical properties of TiN1-xCx thin layers
Z Wokulski - Solid State Crystals in Optoelectronics and …, 1997 - spiedigitallibrary.org
The TiN 1-x C x thin layers were obtained by CVD technique using a flow method from
reactant gas mixture: TiCl 4 (g)-N 2 (g)-CCl 4 (g)-H 2 (g). The obtained thin layers were …
reactant gas mixture: TiCl 4 (g)-N 2 (g)-CCl 4 (g)-H 2 (g). The obtained thin layers were …
[图书][B] Dynamic modelling of chemical vapor deposition for real-time control
M Toledo-Quinones - 1995 - search.proquest.com
Chemical vapor deposition (CVD) is extensively used to produce high quality films critical to
modern technology. Furthermore, CVD promises to meet the ever-increasing requirements …
modern technology. Furthermore, CVD promises to meet the ever-increasing requirements …