High-energy-density pinch plasma: A unique nonconventional tool for plasma nanotechnology

RS Rawat - IEEE Transactions on Plasma Science, 2013 - ieeexplore.ieee.org
Low-temperature (<; 10 eV) plasmas with densities varying over a very wide range from 10
13 m-3 at the lower end to as high as 10 23 m-3 have firmly established themselves as one …

Implantation of Cu onto ZnTe thin film using plasma focus device for optoelectronic applications

AM Hassan, F Diab, EF Kotp, G Al-Kashef… - Optical Materials, 2021 - Elsevier
In the current work, we have doped Cu onto ZnTe thin films at different power (0.0, 0.5, 1.0,
1.5, and 2.0 kJ) by using the Egyptian Atomic Energy Authority-Plasma Focus Device (EAEA …

Synthesis and electrochemical properties of microcanals Mg-S-Cu-S as an electrode material for energy storage applications

MA Ali, A Farid, A Rasheed, M Yousaf… - Journal of …, 2024 - Elsevier
The synthesis of novel nanostructured electrode materials is the community demand to
overcome energy crises. Herein, the nanostructured copper-sulfide, copper-cadmium-sulfide …

Deposition of alumina stabilized zirconia at room temperature by plasma focus device

IA Khan, RS Rawat, R Ahmad, MAK Shahid - Applied surface science, 2014 - Elsevier
Nanostructured multiphase zirconium aluminium oxide (MP-ZrAlO) composite films are
deposited on zirconium substrate by plasma focus device. The XRD results reveal that the …

Plasma focus method for growth of molybdenum nitride thin films: Synthesis and thin film characterization

M Shirazi, M Ghasemloo, GR Etaati… - Journal of Alloys and …, 2017 - Elsevier
Although molybdenum nitride (Mo-N) is prepared intensively by different physical methods,
there are no reports available on Mo-N thin films deposited by Plasma focus (PF) device …

Synthesis and characterization of magnesium aluminate (MgAl2O4) spinel (MAS) thin films

SM Ahmad, T Hussain, R Ahmad… - Materials Research …, 2018 - iopscience.iop.org
In a quest to identify more economic routes for synthesis of magnesium aluminate (MgAl 2 O
4) spinel (MAS) thin films, dense plasma focus device was used with multiple plasma focus …

Hard TiCx/SiC/aC: H nanocomposite thin films using pulsed high energy density plasma focus device

ZA Umar, RS Rawat, KS Tan, AK Kumar… - Nuclear Instruments and …, 2013 - Elsevier
Thin films of TiCx/SiC/aC: H were synthesized on Si substrates using a complex mix of high
energy density plasmas and instability accelerated energetic ions of filling gas species …

Investigation on the structural properties and corrosion inhibition of W coatings on stainless steel AISI 304 using PF device

M Habibi, S Javadi, M Ghoranneviss - Surface and Coatings Technology, 2014 - Elsevier
In this paper, thin films of tungsten are coated on 304 type stainless steel substrates using a
low energy (1.6 kJ) plasma focus device. 35 focus shots are applied each at 6, 8, 10 and 12 …

Effect of deposition parameters on structural and mechanical properties of niobium nitride synthesized by plasma focus device

J Siddiqui, T Hussain, R Ahmad, N Khalid - Chinese Physics B, 2015 - iopscience.iop.org
Abstract Effects of deposition angle and axial distance on the structural and mechanical
properties of niobium nitride synthesized by a dense plasma focus (DPF) system are …

Structural and mechanical properties of zirconia film deposited by plasma focus device

IA Khan, B Freeha, U Ikhlaq, RS Rawat… - Journal of Fusion …, 2015 - Springer
Abstract Nano-crystalline ZrO 2/ZrSiO 4 composite films are deposited on Si by the
irradiation of energetic oxygen ions by plasma focus operation. The XRD patterns confirm …