Fabrication of patterned silane based self-assembled monolayers by photolithography and surface reactions on silicon-oxide substrates

N Herzer, S Hoeppener, US Schubert - Chemical Communications, 2010 - pubs.rsc.org
Self-assembled monolayers (SAMs) have received increasing attention since their
introduction 30 years ago. Soon it was discovered that they can be used as alternative resist …

Chemical modification of self-assembled silane based monolayers by surface reactions

C Haensch, S Hoeppener, US Schubert - Chemical Society Reviews, 2010 - pubs.rsc.org
In this critical review, we look at how the functionalization of solid substrates by self-
assembly processes provides the possibility to tailor their surface properties in a controllable …

Surface chemical reactions on self-assembled silane based monolayers

L Wang, US Schubert, S Hoeppener - Chemical Society Reviews, 2021 - pubs.rsc.org
In this review, we aim to update our review “Chemical modification of self-assembled silane-
based monolayers by surface reactions” which was published in 2010 and has developed …

Engineering silicon oxide surfaces using self‐assembled monolayers

S Onclin, BJ Ravoo… - Angewandte Chemie …, 2005 - Wiley Online Library
Although a molecular monolayer is only a few nanometers thick it can completely change
the properties of a surface. Molecular monolayers can be readily prepared using the …

Self‐assembled silane monolayers: an efficient step‐by‐step recipe for high‐quality, low energy surfaces

M Lessel, O Bäumchen, M Klos, H Hähl… - Surface and …, 2015 - Wiley Online Library
Organosilane self‐assembled monolayers (SAMs) are commonly used for modifying a wide
range of substrates. Depending on the end group, highly hydrophobic or hydrophilic …

Photochemistry and patterning of self-assembled monolayer films containing aromatic hydrocarbon functional groups

CS Dulcey, JH Georger, MS Chen, SW McElvany… - Langmuir, 1996 - ACS Publications
The deep ultraviolet (λ<∼ 250 nm) photochemistry of chemisorbed organosilane self-
assembled films of the type R (CH2) n SiO− surface where n= 0, 1, 2 and R= phenyl …

[引用][C] Surface Modification with Orthogonal Photosensitive Silanes for Sequential Chemical Lithography and Site‐Selective Particle Deposition

A del Campo, D Boos, HW Spiess… - Angewandte Chemie …, 2005 - Wiley Online Library
The site-selective adsorption of molecules and mesoscopic objects at predefined positions
on solid surfaces is a key fabrication step and a major challenge in many applications, such …

Self-assembled silane monolayers: fabrication with nanoscale uniformity

M Wang, KM Liechti, Q Wang, JM White - Langmuir, 2005 - ACS Publications
Illustrating direct connections between surface chemical events and mechanical and
topological characteristics of self-assembled monolayers derived from …

Nucleophilic displacements in mixed self-assembled monolayers

GE Fryxell, PC Rieke, LL Wood, MH Engelhard… - Langmuir, 1996 - ACS Publications
Synthetic elaboration of self-assembled monolayers (SAMs) provides a powerful method for
the preparation of smooth, ordered surfaces with carefully controlled functionality …

Fabrication of chemically patterned surfaces based on template‐directed self‐assembly

N Lu, M Gleiche, J Zheng, S Lenhert, B Xu… - Advanced …, 2002 - Wiley Online Library
Patterned surfaces with selective chemical activity are fabricated on Si/SiO2 surfaces using
self‐assembly techniques and structured Langmuir–Blodgett monolayers as templates (see …